Unintentional F doping of SrTiO 3(001) etched in HF acid-structure and electronic properties

Surface Science

Volumn 606, Issue 3-4, 2012, Pages 554-558

  Chambers, S A ^a   Droubay, T C ^a   Capan, C ^b   Sun, G Y ^c  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b WASHINGTON STATE UNIVERSITY   (United States)

^c NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Strontium titanate; Surface preparation; X ray photoemission

Indexed keywords

BANDBENDING; COMPLEX OXIDES; F-DOPING; HF ACID; IMPURITY SCATTERING; SRTIO; SURFACE LAYERS; SURFACE PREPARATION; SURFACE STATE DENSITY; TIO; TUBE FURNACES; X RAY PHOTO-ELECTRON DIFFRACTION; X-RAY PHOTOEMISSIONS;

DEIONIZED WATER; ELECTRON MOBILITY; ELECTRONIC PROPERTIES; EPITAXIAL GROWTH; HETEROJUNCTIONS; PHOTONS; STRONTIUM; STRONTIUM ALLOYS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

STRONTIUM TITANATES;

EID: 84855452487     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2011.11.029     Document Type: Article

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