Random poly(methyl methacrylate-co-styrene) brushes by ATRP to create neutral surfaces for block copolymer self-assembly

Macromolecular Chemistry and Physics

Volumn 213, Issue 1, 2012, Pages 108-115

  Liu, Hui ^a,b   O'Mahony, Colm T ^c   Audouin, Fabrice ^a   Ventura, Claudia ^a   Morris, Michael ^c,d   Heise, Andreas ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b CENTRAL SOUTH UNIVERSITY   (China)

^c UNIVERSITY COLLEGE CORK   (Ireland)

^d TRINITY COLLEGE DUBLIN   (Ireland)

Author keywords

ATRP; block copolymers; polymer brushes; self assembly

Indexed keywords

BLOCK COPOLYMER SELF-ASSEMBLY; CONSTANT THICKNESS; COPOLYMER BRUSHES; FEED RATIOS; FREE POLYMERS; METHYL METHACRYLATES; NEUTRAL SURFACES; POLYMER BRUSHES; RANDOM COPOLYMER; THEORETICAL VALUES; WATER CONTACT ANGLE;

ACRYLIC MONOMERS; BLOCK COPOLYMERS; BRUSHES; CONTACT ANGLE; ESTERS; FREE RADICAL REACTIONS; GRAFT COPOLYMERS; MONOMERS; PLASTIC COATINGS; POLYMERS; SELF ASSEMBLY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; STYRENE;

ATOM TRANSFER RADICAL POLYMERIZATION;

EID: 84855400135     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.201100531     Document Type: Article

References (26)

1. O. Prucker, J. Rühe, Macromolecules 1998, 31, 602.
2. O. Prucker, J. Rühe, Macromolecules 1998, 31, 592.
3. B. Radhakrishnan, R. Ranjan, W. J. Brittain, Soft Matter 2006, 2, 386.
4. R. Barbey, L. Lavanant, D. Paripovic, N. Schüwer, C. Sugnaux, S. Tugulu, H.-A. Klok, Chem. Rev. 2009, 109, 5437.
5. R. A. Farrell, N. Petkov, M. A. Morris, J. D. Holmes, J. Colloid Interface Sci. 2010, 349, 449.
6. R. A. Farrell, T. G. Fitzgerald, D. Borah, J. D. Holmes, M. A. Morris, J. Mol. Sci. 2009, 10, 3671.
7. R. Limary, P. F. Green, Mater. Res. Soc. Symp. Proc. 2000, 629, FF1.5.1.
8. D. Baskaran, J. W. Mays, M. S. Bratcher, Angew. Chem. Int. Ed. 2004, 43, 2138.
9. K. Dayananda, R. Dhamodharan, J. Polym. Sci., Part A: Polym. Chem. 2004, 42, 902.
10. K. Matyjaszewski, M. Wei, J. Xia, S. G. Gaynor, Macromol. Chem. Phys. 1998, 199, 2289.
11. P. Pasetto, H. Blas, F. Audouin, C. Boissiere, C. Sanchez, M. Save, B. Charleux, Macromolecules 2009, 42, 5983.
12. Y. Katoni, M. Kamigaito, M. Sawamoto, Macromolecules 1998, 31, 5582.
13. A. S. Brar, Puneeta, J. Polym. Sci., Part A: Polym. Chem. 2006, 44, 2076.
14. M. A. Semsarzadeh, M. Abdollahi, Polymer 2008, 49, 3060.
15. R. Luo, A. Sen, Macromolecules 2008, 41, 4514.
16. K. Matyjaszewski, P. J. Miller, N. Shukla, B. Immaraporn, A. Gelman, B. B. Luokala, T. M. Siclovan, G. Kickelbick, T. Vallant, H. Hoffmann, T. Pakula, Macromolecules 1999, 32, 8716.
17. M. Husemann, E. Malmström, M. McNamara, M. Mate, D. Mecerreyes, D. G. Benoit, J. L. Hedrick, P. Mansky, E. Huang, T. P. Russell, C. J. Hawker, Macromolecules 1999, 32, 1424.
18. F. Audouin, H. Blas, P. Pasetto, P. Beaunier, C. Boissiere, C. Sanchez, M. Save, B. Charleux, Macromol. Rapid Commun. 2008, 29, 914.
19. R. X. Chen, W. Feng, S. P. Zhu, G. Botton, B. Ong, Y. L. Wu, Polymer 2006, 47, 1119.
20. P. Pasetto, H. Blas, F. Audouin, C. Boissiere, C. Sanchez, M. Save, B. Charleux, Macromolecules 2009, 42, 5983.
21. K. Matyjaszewski, J. L. Wang, T. Grimaud, D. A. Shipp, Macromolecules 1998, 31, 1527.
22. K. Matyjaszewski, D. A. Shipp, J. L. Wang, T. Grimaud, T. E. Patten, Macromolecules 1998, 31, 6836.
23. X. Y. Sun, H. L. Zhang, X. H. Huang, X. Y. Wang, Q. F. Zhou, Polymer 2005, 46, 5251.
24. B. Zhao, W. J. Brittain, Macromolecules 2000, 33, 8813.
25. B. Zhao, Polymer 2003, 44, 4079.
26. D. Borah, M. T. Shaw, S. Rasappa, R. A. Farrell, C. O'Mahony, C. M. Faulkner, M. Bosea, P. Gleeson, J. D. Holmes, M. A. Morris, J. Phys. D: Appl. Phys. 2011, 44, 174012.