Optical and wetting properties of CuAlO 2 films prepared by radio frequency magnetron sputtering

Journal of the American Ceramic Society

Volumn 95, Issue 1, 2012, Pages 431-435

  Li, Junlei ^a   Wang, Xian ^a   Shi, Shiwei ^a   Song, Xueping ^a   Lv, Jianguo ^a,b   Cui, Jingbiao ^c   Sun, Zhaoqi ^a  

^a ANHUI UNIVERSITY   (China)

^b HEFEI NORMAL UNIVERSITY   (China)

^c University of Arkansas at Little Rock ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURES; AS-DEPOSITED FILMS; BAND GAP VARIATION; DIRECT BAND GAP; EXPOSURE-TIME; OPTICAL STUDY; ORGANIC STAINS; QUARTZ SUBSTRATE; RADIO FREQUENCY MAGNETRON SPUTTERING; REFLECTANCE MEASUREMENTS; SCANNING ELECTRON MICROSCOPES; ULTRAVIOLET LIGHT SOURCES; VISIBLE RANGE; WATER CONTACT ANGLE; WETTING PROPERTY; WIDE SPREADS;

AMORPHOUS FILMS; ANNEALING; CONTACT ANGLE; COPPER; ENERGY GAP; LIGHT SOURCES; QUARTZ; RADIO; RADIO WAVES; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SINTERING; SURFACE ROUGHNESS; SURFACES; ULTRAVIOLET RADIATION; WETTING; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

FILM PREPARATION;

EID: 84855355639     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2011.04943.x     Document Type: Article

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