Reversible wettability of nanostructured ZnO thin films by sol-gel method

Applied Surface Science

Volumn 256, Issue 14, 2010, Pages 4720-4723

  Lü, Jianguo ^a,b   Huang, Kai ^c   Chen, Xuemei ^b   Zhu, Jianbo ^b   Meng, Fanming ^a   Song, Xueping ^a   Sun, Zhaoqi ^a  

^a ANHUI UNIVERSITY   (China)

^b HEFEI NORMAL UNIVERSITY   (China)

^c ANHUI JIANZHU UNIVERSITY   (China)

Author keywords

Hydrophobicity; Reversible wettability; Sol gel; Surface topography; ZnO

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; HYDROPHOBICITY; II-VI SEMICONDUCTORS; METALLIC FILMS; MICROSTRUCTURE; OPTICAL FILMS; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; TOPOGRAPHY; WETTING; ZINC OXIDE; ZINC SULFIDE;

ANNEALING TEMPERATURES; HEXAGONAL WURTZITE STRUCTURE; LIGHT-INDUCED PROCESS; NANOSTRUCTURED ZNO; QUARTZ SUBSTRATE; UV ILLUMINATIONS; WATER CONTACT ANGLE; X RAY DIFFRACTOMETERS;

THIN FILMS;

EID: 77950593585     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.080     Document Type: Article

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