Modifications in SnS thin films by plasma treatments

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 272, Issue , 2012, Pages 351-356

  Martinez H ^a   Avellaneda, D ^b  

^a INSTITUTO DE CIENCIAS FÍSICAS   (Mexico)

^b UNIVERSIDAD AUTÓNOMA DE NUEVO LEÓN   (Mexico)

Author keywords

Glow discharge; Plasma treatment; Thin films; Tin sulfide

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; ENERGY GAP; GLOW DISCHARGES; NITROGEN; NITROGEN PLASMA; PLASMA APPLICATIONS; TIN;

AIR AND NITROGEN PLASMAS; CHEMICAL BATH DEPOSITION METHODS; CRYSTALLINE STRUCTURE; ELECTRICAL CHARACTERISTIC; ELECTRICAL CONDUCTIVITY; PLASMA TREATMENT; SPECTROSCOPY MEASUREMENTS; TIN SULFIDE;

THIN FILMS;

EID: 84655174895     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.01.099     Document Type: Conference Paper

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