Four-port nanophotonic frustrated total internal reflection coupler

IEEE Photonics Technology Letters

Volumn 24, Issue 1, 2012, Pages 58-60

  MacFarlane, Duncan L ^a   Christensen, Marc P ^b   Liu, Ke ^a   LaFave, Tim P ^a   Evans, Gary A ^b   Sultana, Nahid ^a   Kim, T W ^a   Kim, Jiyoung ^a   Kirk, Jay B ^b   Huntoon, Nathan ^b   Stark, Andrew J ^c   Dabkowski, Mieczyslaw ^d   Hunt, Louis R ^a   Ramakrishna, Viswanath ^d  

^a The University of Texas at Dallas   (United States)

^b Southern Methodist University   (United States)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^d UNIVERSITY OF TEXAS AT DALLAS   (United States)

Author keywords

Frustrated total internal reflection; integrated photonics; nanophotonics

Indexed keywords

ALUMINA; FINITE DIFFERENCE TIME DOMAIN METHOD; GALLIUM COMPOUNDS; III-V SEMICONDUCTORS; INDIUM PHOSPHIDE; NANOPHOTONICS; PHOTONICS; REFRACTIVE INDEX; RIDGE WAVEGUIDES; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR QUANTUM WELLS;

ATOMIC-LAYER DEPOSITION; COUPLING COEFFICIENT; DEEP TRENCH; DOMAIN THEORY; FRUSTRATED TOTAL INTERNAL REFLECTIONS; INTEGRATED PHOTONICS; OPTICAL PATH; QUANTUM-WELLS; THREE DIMENSIONAL FINITE DIFFERENCE TIME DOMAINS;

ALUMINUM OXIDE;

EID: 84555188960     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2011.2172204     Document Type: Article

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