Target system for fabrication and control of magnetic metal content in diluted magnetic semiconductors by pulsed-laser deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 5, 2004, Pages 2096-2100

  Orii, T ^a   Seto, T ^a   Hirasawa, M ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; CRYSTALLINE MATERIALS; FERROMAGNETISM; LASER BEAM EFFECTS; NICKEL; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING; SYNTHESIS (CHEMICAL); VACUUM APPLICATIONS;

CERAMIC TARGETS; ELECTRON PROBE MICROANALYSIS; MAGNETOTRANSPORT; METAL CONTENT;

MAGNETIC SEMICONDUCTORS;

EID: 8344226838     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1772369     Document Type: Article

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