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Volumn , Issue , 2011, Pages 155-158

X-ray radiation effect on CMOS imagers with in-pixel buried-channel source follower

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE PIXEL; BURIED CHANNELS; CMOS IMAGE SENSOR; CMOS IMAGERS; DYNAMIC RANGE; IMAGING APPLICATIONS; INTERFACE TRAPS; OUTPUT SWING; PIXEL STRUCTURE; RANDOM NOISE; RANDOM TELEGRAPH SIGNAL NOISE; SOURCE FOLLOWERS; X RAY RADIATION;

EID: 82955195022     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2011.6044211     Document Type: Conference Paper
Times cited : (3)

References (8)
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    • Y.Chen, X. Wang, A. J. Mierop, and A. J. P. Theuwissen, "A CMOS Image Sensor With In-Pixel Buried-Channel Source Follower and Optimized Row Selector", in IEEE Trans. Electron Dev., vol.56, no.11, pp. 2390-2397, Nov. 2009
    • (2009) IEEE Trans. Electron Dev. , vol.56 , Issue.11 , pp. 2390-2397
    • Chen, Y.1    Wang, X.2    Mierop, A.J.3    Theuwissen, A.J.P.4
  • 3
    • 46049116691 scopus 로고    scopus 로고
    • Fully Optimized Cu Based Process with Dedicated Cavity Etch for 1.75μm and 1.45μm Pixel Pitch CMOS Image Sensors
    • Dec.
    • M. Cohen, et al., "Fully Optimized Cu Based Process with Dedicated Cavity Etch for 1.75μm and 1.45μm Pixel Pitch CMOS Image Sensors," in IEDM Tech. Dig., Dec. 2006, pp.127-130
    • (2006) IEDM Tech. Dig. , pp. 127-130
    • Cohen, M.1
  • 5
    • 33646941445 scopus 로고    scopus 로고
    • Characterization and Improvement of Random Noise in 1/3.2" UXGA CMOS Image Sensor with 2.8um Pixel using 0.13um-Technology
    • presented at
    • J. Y. Kim, et.al., "Characterization and Improvement of Random Noise in 1/3.2" UXGA CMOS Image Sensor with 2.8um Pixel using 0.13um-Technology," presented at IEEE Workshop on CCD's and Advanced Image Sensors, Karuizawa, Nagano, Japan, Jun. 2005, pp. 149-152.
    • IEEE Workshop on CCD's and Advanced Image Sensors, Karuizawa, Nagano, Japan, Jun. 2005 , pp. 149-152
    • Kim, J.Y.1
  • 7
    • 57149144029 scopus 로고    scopus 로고
    • Bellingham, Washington USA, SPIE Press
    • J. R. Janesick, Photon Transfer, Bellingham, Washington USA, SPIE Press, pp.144, 2007
    • (2007) Photon Transfer , pp. 144
    • Janesick, J.R.1
  • 8
    • 16644377435 scopus 로고
    • Silicon-hydrogen bonding and hydrogen diffusion in amorphous silicon
    • Apr.
    • C. G. Van de Walle and R. A. Street, "Silicon-hydrogen bonding and hydrogen diffusion in amorphous silicon," Phy. Rev. B, vol. 51, pp. 10615-10618, Apr. 1995.
    • (1995) Phy. Rev. B , vol.51 , pp. 10615-10618
    • Van De Walle, C.G.1    Street, R.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.