Low-temperature graphene growth using epochal catalyst of PdCo alloy

Applied Physics Letters

Volumn 99, Issue 22, 2011, Pages

  Kim, Eun Sung ^a   Shin, Hyeon Jin ^b   Yoon, Seon Mi ^b   Han, Gang Hee ^a   Chae, Seung Jin ^a   Bae, Jung Jun ^a   Gunes, Fethullah ^a   Choi, Jae Young ^b   Lee, Young Hee ^a  

^a Sungkyunkwan University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INCORPORATION; DECOMPOSITION RATE; GLASS SUBSTRATES; GRAPHENE GROWTH; GRAPHENE LAYERS; GRAPHITIC LAYERS; HIGH TRANSMITTANCE; LOW TEMPERATURES; NANO-SIZE; NI CATALYSTS; REMOTE RF;

ALLOYS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; COBALT; GRAPHENE; HYDROCARBONS; PALLADIUM; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SUBSTRATES; X RAY DIFFRACTION;

CERIUM ALLOYS;

EID: 82955194684     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3665616     Document Type: Article

References (19)

1. K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva, and A. A. Firsov, Science 306, 666 (2004). 10.1126/science.1102896 (Pubitemid 39440910)
2. S. J. Chae, F. Gunes, K. K. Kim, E. S. Kim, G. H. Han, S. M. Kim, H. J. Shin, S. M. Yoon, J. Y. Choi, M. H. Park, C. W. Yang, Adv. Mater. 21, 2328 (2009). 10.1002/adma.200803016
3. K. S. Kim, Y. Zhao, H. Jang, S. Y. Lee, J. M. Kim, K. S. Kim, J. H. Ahn, P. Kim, J. Y. Choi, and B. H. Hong, Nature 457, 706 (2009). 10.1038/nature07719
4. Y. Zhu, S. Murali, W. Cai, X. Li, J. W. Suk, J. R. Potts, and R. S. Ruoff, Adv. Mater. 22, 3906 (2010). 10.1002/adma.201001068
5. W. J. Yu, S. Y. Lee, S. H. Chae, D. Perello, G. H. Han, M. Yun, and Y. H. Lee, Nano Lett. 11, 1344 (2011). 10.1021/nl104488z
6. K. S. Novoselov, D. Jiang, F. Schedin, T. J. Booth, V. V. Khotkevich, S. V. Morozov, and A. K. Geim, Proc. Natl. Acad. Sci. U.S.A. 102, 10451 (2005). 10.1073/pnas.0502848102 (Pubitemid 41061574)
7. Y. Lee, S. Bae, H. Jang, S. Jang, S.-E. Zhu, S. H. Sim, Y. I. Song, B. H. Hong, and J.-H. Ahn, Nano Lett. 10, 490 (2010). 10.1021/nl903272n
8. A. Reina, X. Jia, J. Ho, D. Nezich, H. Son, V. Bulovic, M. S. Dresselhaus, and J. Kong, Nano Lett. 9, 30 (2009). 10.1021/nl801827v
9. Q. Yu, J. Lian, S. Siripongler, H. Li, Y. P. Chen, and S.-S. Pei, Appl. Phys. Lett. 93, 113103 (2008). 10.1063/1.2982585
10. X. Li, Y. Zhu, W. Cai, M. Borysiak, B. Han, D. Chen, R. D. Piner, L. Colombo, and R. S. Ruoff, Nano Lett. 9, 4359 (2009). 10.1021/nl902623y
11. X. Li, W. Cai, J. An, S. Kim, J. Nah, D. Yang, R. Piner, A. Velamakanni, I. Jung, E. Tutuc, S. K. Banerjee, Science 324, 1312 (2009). 10.1126/science.1171245
12. J. Kim, M. Ishihara, Y. Koga, K. Tsugawa, M. Hasegawa, and S. Iijima, Appl. Phys. Lett. 98, 091502 (2011). 10.1063/1.3561747
13. Z. Li, P. Wu, C. Wang, X. Fan, W. Zhang, X. Zhai, C. Zeng, Z. Li, J. Yang, and J. Hou, ACS Nano 5, 3385 (2011). 10.1021/nn200854p
14. O. Savadogo, K. Lee, K. Oishi, S. Mitsushima, N. Kamiya, and K.-I. Ota, Electrochem. Commun. 6, 105 (2004). 10.1016/j.elecom.2003.10.020
15. K. Lee, O. Savadogo, A. Ishihara, S. Mitsushima, N. Kamiya, and K.-I. Ota, J. Electrochem. Soc. 153, A20 (2006). 10.1149/1.2128101
16. L. V. Babenkova, I. N. Blagovshchenskaya, N. M. Popova, N. K. Nadirov, L. F. Lykova, and N. I. Kondratkova, Chem. Technol. Fuels Oils 21, 520 (1986). 10.1007/BF00726701
17. F. Gunes, H. J. Shin, C. Biswas, G. H. Han, E. S. Kim, S. J. Chae, J. Y. Choi, and Y. H. Lee, ACS Nano 4, 4595 (2010). 10.1021/nn1008808
18. PDF-2 database, International Centre for Diffraction Data, Swarthmore, PA, 2001, JCPDS no. 50-1437.
19. M. Heibel, G. Kumar, C. Wyse, P. Bukovec, and A. B. Bocarsly, Chem. Mater. 8, 1504 (1996). 10.1021/cm960105u