Influence of inert gases on ionized magnetron plasma deposition of carbon nitride thin films

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 601-605

  Kusano, Y ^a   Barber, Z H ^a   Evetts, J E ^a   Hutchings, I M ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Carbon nitride films; Inert gases; Ionized magnetron

Indexed keywords

BACKSCATTERING; CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS TESTING; INDENTATION; INERT GASES; ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; THIN FILMS;

NANOINDENTATIONS; PLASMA DEPOSITIONS;

SPUTTER DEPOSITION;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144454026     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00326-8     Document Type: Article

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