SCOPUS 정보 검색 플랫폼

Journal of Applied Physics

Volumn 110, Issue 10, 2011, Pages

In-situ x-ray diffraction studies on post-deposition vacuum-annealing of ultra-thin iron oxide films

(6) Bertram, F a Deiter, C a Pflaum, K a Suendorf, M b Otte, C b Wollschlger, J b

a DESY (Germany)

b UNIVERSITY OF OSNABRÜCK (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; EPITAXIALLY GROWN; HIGH VACUUM; IN-SITU; IN-SITU X-RAY DIFFRACTION; MAGHEMITES; POST DEPOSITION ANNEALING; POST-DEPOSITION; SINGLE CRYSTAL SUBSTRATES; STRUCTURAL PHASE TRANSITION; STRUCTURAL TRANSITIONS; ULTRA-THIN; VACUUM-ANNEALING;

CRYSTAL STRUCTURE; EPITAXIAL GROWTH; IRON; IRON ORES; IRON OXIDES; MOLECULAR BEAM EPITAXY; SINGLE CRYSTALS; SURFACE STRUCTURE; VACUUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 82555180456 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3661655 Document Type: Conference Paper

Times cited : (20)

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