Vibrational and morphological properties of Sn-doped CdS films deposited by ultrasonic spray pyrolysis method

Materials Science in Semiconductor Processing

Volumn 13, Issue 5-6, 2010, Pages 325-328

  Özer, Tülay ^a   Aksay, Sabiha ^a   Kose, Salih ^b  

^a ANADOLU UNIVERSITY   (Turkey)

^b ESKISEHIR OSMANGAZI UNIVERSITY   (Turkey)

Author keywords

CdS Films; FT IR; Raman; Surface morphology

Indexed keywords

ABSORPTION PEAKS; AFM; CDS; CDS FILMS; CO STRETCHING FREQUENCIES; FIRST-ORDER; FT-IR; FT-IR SPECTRUM; GLASS SUBSTRATES; INTENSE BANDS; LONGITUDINAL OPTICS; MORPHOLOGICAL PROPERTIES; PEAK INTENSITY; PHONON PEAKS; RAMAN; RAMAN SPECTRUM; SECOND ORDERS; SN CONCENTRATION; SN DOPING; SN-DOPED; TIN INCORPORATION; ULTRASONIC SPRAY PYROLYSIS; ULTRASONIC SPRAY PYROLYSIS METHOD;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CADMIUM COMPOUNDS; CADMIUM SULFIDE; MORPHOLOGY; PHONONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SUBSTRATES; SURFACE MORPHOLOGY; TIN;

SPRAY PYROLYSIS;

EID: 82455175270     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2011.02.013     Document Type: Article

References (31)

1. M.B. Ortuno Lopez, M. Sotelo-Lerma, A. Mendoza-Galva, and R. Ramirez-Bon Vacuum 76 2004 181 184
2. D. Patidar, R. Sharma, N. Jain, T.P. Sharma, and N.S. Saxena Bull Mater Sci 29 1 2006 21 24
3. P.P. Sahay, R.K. Nath, and S. Tewari Cryst Res Technol 42 3 2007 275 280
4. N.M. Megahid, M.M. Wakkad, E.K.H. Shokr, and N.M. Abass Physica B 353 2004 150 163
5. J. Lee Thin Solid Films 451452 2004 170 174
6. D. Petre, I. Pintilie, E. Pentia, I. Pintilie, and T. Botila Mater Sci Eng B 58 1999 238 243
7. K. Ernits, D. Bremaud, S. Buecheler, C.J. Hibbert, M. Kaelin, and G. Khrypunov Thin Solid Films 515 2007 6051 6054
8. H.H. Afify, and I.K.J. Battisha Mater Sci Mater Electron 11 2000 373 377
9. H. Uda, H. Sonomura, and S. Ikegami Meas Sci Technol 8 1997 86 91
10. M.D.G. Potter, M. Cousins, K. Durose, and D.P.J. Halliday Mater Sci Mater Electron 11 2000 525 530
11. P.C. Pande, G.J. Russell, and J. Woods J Phys D: Appl Phys 1 6 1983 2307 2316
12. S. Aksay, T. Özer, and M. Zor Eur Phys J Appl Phys. 47 2009 30502 30504
13. T. Özer, and S. Köse Int J Hydrogen Energy 3 2009 5186 5190
14. P.K. Ghosh, U.N. Maiti, Ahmed SkF, and K.K. Chattopadhyay Sol Energy Mater Sol Cells 90 2006 2616 2629
15. P.J. George, A. Sanchez-Juarez, and P.K. Nair Semicond Sci Technol 11 1996 1090 1095
16. F. Atay, V. Bilgin, I. Akyüz, and S. Köse Mater Sci Semicond Process 6 2003 197 203
17. B. Tell, T.C. Damen, and S.P.S. Porto Phys Rev 144 2 1966 771 774
18. L. Zeiri, I. Patla, S. Acharya, Y. Golan, and S. Efrima J Phys Chem 111 2007 11843 11848
19. J.R.L. Fernandez, M. Souza-Parise, and P.C. Morais Surf Sci 601 2007 3805 3808
20. N. Romcevic, R. Kostic, M. Romcevic, M.I. Comor, and J.M. Nedeljkovic J Phys D Appl Phys 38 2005 4321 4324
21. I.O. Oladeji, L. Chow, J.R. Liu, W.K. Chu, A.N.P. Bustamante, and C. Fredricksen Thin Solid Films 359 2000 154 159
22. R.C.C. Leite, and S.P.S. Porto Phys Rev Lett 17 1966 10 12
23. V. Sivasubramanian, A.K. Arora, M. Premila, C.S. Sundar, and V.S. Sastry Physica E 31 2006 93 98
24. R.R. Prabhu, and M. Abdul Khadar Bull Mater Sci 31 2008 511 515
25. T. Komatsu, H. Mohri, M. Ohno, and K.J. Matusita Mater Sci Lett 11 1992 324 326
26. H. Jerominek, M. Pigeon, S. Patela, Z. Jakubczk, C. Delilse, and R. Tremblay J Appl Phys 63 1988 957 959
27. R.J. Briggs, and A.K. Ramdas Phys Rev B 13 1976 5518 5529
28. P. Thangadurai, S. Balaji, and P.T. Manoharan Nanotechnology 19 2008 435708-p8
29. M.F. Kotkata, A.E. Masoud, M.B. Mohamed, and E.A. Mahmoud Physica E 41 2009 1457 1465
30. Z.R. Khan, M. Zulfequar, and M.S. Khan Mater Sci Engineering B 174 2010 145 149
31. H. Tang, M. Yan, H. Zhang, M. Xia, and D. Yang Mater Lett 59 2005 1024 1027