Modeling and experiments of non-telecentric thick mask effects for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  McIntyre, Gregory ^a   Koay, Chiew Seng ^a   Burkhardt, Martin ^a   Mizuno, Hiro ^b   Wood, Obert ^c  

^a IBM RESEARCH   (United States)

^b Toshiba America Electronics Corporation   (United States)

^c ADVANCED MICRO DEVICES   (United States)

Author keywords

Edge effects; EUV lithography; HV bias; Non telecentric thick mask effects; Shadow effect

Indexed keywords

EDGE EFFECTS; EUV LITHOGRAPHY; HV BIAS; NON-TELECENTRIC THICK MASK EFFECTS; SHADOW EFFECT;

EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; OPTOELECTRONIC DEVICES; SPACE PROBES;

ULTRAVIOLET DEVICES;

EID: 67149098345     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813536     Document Type: Conference Paper

References (10)

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