Imprint lithography template technology for bit patterned media (BPM)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8166, Issue , 2011, Pages

  Lille, J ^a   Patel, K ^a   Ruiz, R ^a   Wu, T W ^a   Gao, H ^a   Wan, L ^a   Zeltzer, G ^a   Dobisz, E ^a   Albrecht, T R ^a  

^a HITACHI AMERICA LTD   (United States)

Author keywords

Bit aspect ratio; Imprint lithography; Imprint template; Patterned skew; Self assembly

Indexed keywords

BIT-PATTERNED MEDIA; CHEMICAL CONTRAST; DESIGN CONSTRAINTS; DIRECTED SELF-ASSEMBLY; DOT PATTERNS; E-BEAM LITHOGRAPHY; HARD DISK DRIVE; HEXAGONAL CLOSE PACKED; IMPRINT LITHOGRAPHY; IMPRINT TEMPLATE; NANO-IMPRINT; NANOFABRICATION PROCESS; PATTERNED MEDIAS; PATTERNED SKEW; READ HEADS; TEMPLATE FABRICATION; TEMPLATE TECHNOLOGY; THERMALLY STABLE;

ASPECT RATIO; BLOCK COPOLYMERS; HARD DISK STORAGE; MAGNETIC STORAGE; NANOTECHNOLOGY; PHOTOMASKS; SELF ASSEMBLY; TECHNOLOGY;

NANOIMPRINT LITHOGRAPHY;

EID: 81455137592     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.898785     Document Type: Conference Paper

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