Photoreduction of chlorothalonil fungicide on plant leaf models

Environmental Science and Technology

Volumn 45, Issue 22, 2011, Pages 9582-9589

  Monadjemi, S ^a   El Roz, M ^a   Richard, C ^a   Ter Halle, A ^a  

^a UNIVERSITÉ CLERMONT AUVERGNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHLOROTHALONIL; HALF LIVES; ITS EFFICIENCIES; LASER FLASH PHOTOLYSIS; METEOROLOGICAL FACTORS; N-HEPTANES; PHOTO-REDUCTION; PHYSICOCHEMICAL CHARACTERISTICS; PLANT LEAF; RADICAL MECHANISM; REDUCTIVE DECHLORINATION; RELATIVE IMPORTANCE; SIMULATED SOLAR LIGHT; SINGLET OXYGEN; STEADY-STATE IRRADIATION; UPPER LAYER;

CROPS; DECHLORINATION; FUNGICIDES; HEPTANE; PARAFFIN WAXES; PARAFFINS; PHOTOLYSIS; VEGETATION;

PHOTODEGRADATION;

2 PROPANOL; ACETONITRILE; CHLOROTHALONIL; HEPTANE; OXYGEN; PHENOL;

DISSIPATION; FUNGICIDE; HYDROPHOBICITY; IRRADIATION; LEAF; PENETRATION; PHOTODEGRADATION; PHOTOLYSIS; PHYSICOCHEMICAL PROPERTY; STEADY-STATE EQUILIBRIUM; VOLATILIZATION; WAX;

ARTICLE; CHEMICAL REACTION KINETICS; CONTROLLED STUDY; DECHLORINATION; PHOTOCHEMISTRY; PHOTODEGRADATION; PHOTOLYSIS; PLANT LEAF; PROTON TRANSPORT; QUANTUM YIELD; REDUCTION;

FUNGICIDES, INDUSTRIAL; HEPTANES; NITRILES; OXIDATION-REDUCTION; PHOTOLYSIS; PLANT LEAVES; PLANTS;

EID: 81055147887     PISSN: 0013936X     EISSN: 15205851     Source Type: Journal    
DOI: 10.1021/es202400s     Document Type: Article

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