Tribological behavior of radio-frequency sputtering WS2 thin films with vacuum annealing

Thin Solid Films

Volumn 520, Issue 2, 2011, Pages 849-852

  Du, G Y ^a   Ba, D C ^a   Tan, Z ^b   Liu, K ^a  

^a NORTHEASTERN UNIVERSITY   (China)

^b TV University   (China)

Author keywords

Structure; Tribological performance; Tungsten disulfide film; Vacuum annealing

Indexed keywords

ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; HEXAGONAL STRUCTURES; RADIO-FREQUENCY SPUTTERING; RF-SPUTTERING; STEEL SUBSTRATE; STRUCTURE PROPERTY; TRIBOLOGICAL BEHAVIORS; TRIBOLOGICAL PERFORMANCE; TRIBOMETERS; TUNGSTEN DISULFIDE; TUNGSTEN DISULFIDE FILM; VACUUM ANNEALING; X-RAY DIFFRACTION TECHNIQUES;

ANNEALING; CRYSTALLIZATION; ENERGY DISPERSIVE SPECTROSCOPY; MARTENSITIC STEEL; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; THIN FILMS; TUNGSTEN; VACUUM; X RAY DIFFRACTION;

TRIBOLOGY;

EID: 80755132245     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.195     Document Type: Conference Paper

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