The influence of plasma defocusing in high harmonic generation

Optics Express

Volumn 19, Issue 23, 2011, Pages 22377-22387

  Lai, Chien Jen ^a   Kärtner, Franz ^a,b  

^a Department of Electrical Engineering and Computer Science   (United States)

^b UNIVERSITY OF HAMBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMAS;

DEFOCUSING; DRIVER WAVELENGTH; ENHANCEMENT FACTOR; FIRST-ORDER; HIGH DENSITY; HIGH HARMONIC GENERATION; IONIZED MEDIUM; PULSE INTENSITY;

HARMONIC GENERATION;

EID: 80755127078     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.022377     Document Type: Article

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