Annealing temperature dependent oxygen vacancy behavior in SnO2 thin films fabricated by pulsed laser deposition

Current Applied Physics

Volumn 11, Issue 3 SUPPL., 2011, Pages

  Ke, C ^a   Zhu, W ^a   Pan, J S ^b   Yang, Z ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Annealing effect; Fourier transform infrared spectroscopy; Oxygen vacancy; Tin oxide; X ray photoemission spectroscopy

Indexed keywords

ANNEALING EFFECTS; ANNEALING PROCESS; ANNEALING TEMPERATURES; CRYSTAL GRAINS; OXIDATION EFFECTS; OXYGEN SPECIES; QUARTZ SUBSTRATE; VACANCY DENSITY; X RAY PHOTOEMISSION SPECTROSCOPY;

ANNEALING; DEPOSITION; DESORPTION; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN GROWTH; LUMINESCENCE OF ORGANIC SOLIDS; OXIDE FILMS; OXYGEN; PHOTOEMISSION; PULSED LASER DEPOSITION; PULSED LASERS; QUARTZ; THIN FILMS; TIN; TIN OXIDES; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OXYGEN VACANCIES;

EID: 80255135493     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.11.067     Document Type: Conference Paper

References (21)

1. R. Ramesh, and D.G. Schlom MRS Bull. 33 2008 1006 1014
2. R. Dolbec, and M.A. El Khakani Appl. Phys. Lett. 90 2007 173114
3. Z.Z. Yuan, D.S. Li, M.H. Wang, P.L. Chen, D.R. Gong, P.H. Cheng, and D.R. Yang Appl. Phys. Lett. 92 2008 121908
4. S.J. Laverty, and P.D. Maguire J. Vac. Sci. Technol. B. 19 2001 1 6
5. C. Kilic, and A. Zunger Phys. Rev. Lett. 88 2002 095501
6. K.G. Godinho, A. Walsh, and G.W. Watson J. Phys. Chem. C 113 2009 439 448
7. Fan Jiwei, and Freer Robert Appl. Phys. Lett. 90 2007 093511
8. C. Drake, and S. Seal Appl. Phys. Lett. 90 2007 233117
9. J.M.D. Coey, A.P. Douvalis, C.B. Fitzgerald, and M. Venkatesan Appl. Phys. Lett. 84 2004 1332 1334
10. J.T. Cheung Pulser Laser Deposition of Thin Films 1994 Wiley Interscience New York
11. R. Tala-Ighil, M. Boumaour, M.S. Belkaïd, A. Maallemi, K. Melhani, and A. Iratni Sol. Energy Mater. Sol. Cells 90 2006 1797 1814
12. S. Lenaerts, J. Roggen, and G. Maes Spectrochim. Acta A Mol. Biomol. Spectrosc. 51 1995 883 894
13. H. He, H.X. Dai, and C.T. Au Appl. Catal. B. 33 2001 65 80
14. K. Tabata, Y. Hirano, and E. Suzuki Appl. Catal. A Gen. 170 1998 245 254
15. Yue Wu, Tao Yu, Bo-sheng Dou, Cheng-xian Wang, Xiao-fan Xie, Zuo-long Yu, Shu-rong Fan, Zhi-rong Fan, and Lian-chi Wang J. Catal. 120 1989 88 107
16. H. Lu, J.S. Pan, X.F. Chen, W.G. Zhu, and O.K. Tan Appl. Phys. Lett. 88 2006 132907
17. D.P. Norton Mat. Sci. Eng. R 43 2004 139 247
18. D.E. Williams Sensor. Actuat. B-chem 57 1999 1 16
19. G. Goncalves, P. Barquinha, L. Raniero, R. Martins, and E. Fortunato Thin Solid Films 516 2008 1374 1376
20. M. Batzill, and U. Diebold Prog. Surf. Sci. 79 2005 47 154
21. C.H. Shek, and G.M. Lin J. Mater. Res. 15 2000 1994 1997