Kinetics of oxygen diffusion into multilayer ceramic capacitors during the re-oxidation process and its implications on dielectric properties

Journal of the American Ceramic Society

Volumn 94, Issue 11, 2011, Pages 3934-3940

  Kaneda, Kazumi ^a,b   Lee, Soonil ^a   Donnelly, Niall J ^a   Qu, Weiguo ^a   Randall, Clive A ^a   Mizuno, Youichi ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b TAIYO YUDEN CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMPHOTERIC DOPING; CHEMICAL DIFFUSION COEFFICIENTS; CO-FIRING; ELECTRICAL CONDUCTIVITY; HIGH RESISTIVITY; IMPEDANCE MEASUREMENT; IN-SITU; INTERNAL ELECTRODES; MULTI-LAYER CERAMIC CAPACITOR; MULTI-LAYER DEVICES; MULTILAYER CERAMIC CAPACITORS; OXYGEN DIFFUSION; OXYGEN STOICHIOMETRY; RE-OXIDATION; SCHOTTKY BARRIER HEIGHTS; SINTERING PROCESS; TEMPERATURE RANGE; THERMAL PROCESS;

ACTIVATION ENERGY; CERAMIC CAPACITORS; CERAMIC MATERIALS; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; ELECTRIC CONDUCTIVITY; ELECTROLYTIC CAPACITORS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; FIRING (OF MATERIALS); HOLMIUM; INTERNAL OXIDATION; MULTILAYERS; OXIDATION RESISTANCE; OXYGEN; SCHOTTKY BARRIER DIODES; SINTERING; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY;

OXYGEN VACANCIES;

EID: 80155210654     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2011.04623.x     Document Type: Article

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