Chemical vapor deposition model of polysilicon in a trichlorosilane and hydrogen system

Journal of the Electrochemical Society

Volumn 155, Issue 6, 2008, Pages

  Del Coso, G ^a   Del Canizo C ^a   Luque, A ^a  

^a INSTITUTO DE ENERGÍA SOLAR   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; HYDROGEN; SILANES;

DEPOSITION EFFICIENCY; HYDROGEN SYSTEM; MOLAR FRACTION; TRICHLOROSILANE;

POLYSILICON;

EID: 43049121758     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2902338     Document Type: Article

References (15)