Surface modification of titanium membrane by chemical vapor deposition and its electrochemical self-cleaning

Applied Surface Science

Volumn 258, Issue 1, 2011, Pages 489-493

  Li, X W ^a,b   Li, J X ^c   Gao, C Y ^d   Chang, M ^a,b  

^a TIANJIN UNIVERSITY   (China)

^b TIANJIN UNIVERSITY OF TECHNOLOGY   (China)

^c TIANJIN POLYTECHNIC UNIVERSITY   (China)

^d CHINESE PEOPLE S ARMED POLICE FORCE ACADEMY   (China)

Author keywords

Boron doped diamond (BDD); Electrochemistry; Membrane cleaning

Indexed keywords

BOOLEAN FUNCTIONS; BORON; CHEMICAL CLEANING; CHEMICAL MODIFICATION; COMPOSITE MEMBRANES; DIAMOND FILMS; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; MEMBRANE FOULING; MEMBRANES; SURFACE TREATMENT;

BORON DOPED DIAMOND; BORON-DOPED DIAMOND FILMS; CONCENTRATION POLARIZATION; KEY ISSUES; MEMBRANE CLEANING; MEMBRANE SEPARATION; POROUS TITANIUM; SELF CLEANING;

CHEMICAL VAPOR DEPOSITION;

EID: 80054718530     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.08.083     Document Type: Article

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