|
|
Volumn 511, Issue 1, 2012, Pages 115-122
|
|
Influence of solution pH in electrodeposited iron diselenide thin films
|
|
Author keywords
Atomic force microscopy; Microstructure; Optical properties; rms microstrain; Thin films; X ray diffraction
|
|
Indexed keywords
CONDUCTING GLASS;
DEPOSITED FILMS;
DIELECTRIC CONSTANTS;
DIELECTRIC SUSCEPTIBILITY;
DISLOCATION DENSITIES;
ELECTRODEPOSITED IRON;
ELECTROLYTIC BATHS;
ENERGY DISPERSIVE ANALYSIS;
EXTINCTION COEFFICIENTS;
FILM COMPOSITION;
GROWTH MECHANISMS;
INDIUM DOPED TIN OXIDES;
MICRO-STRAIN;
MICROSTRUCTURAL PARAMETERS;
OPTICAL ABSORPTION MEASUREMENT;
OPTICAL PARAMETER;
ORTHORHOMBIC STRUCTURES;
POTENTIAL REGION;
PREFERENTIAL ORIENTATION;
RMS MICROSTRAIN;
SOLUTION PH;
STACKING FAULT PROBABILITY;
X-RAY LINE PROFILE ANALYSIS;
ATOMIC FORCE MICROSCOPY;
CRYSTALLITE SIZE;
CYCLIC VOLTAMMETRY;
DIFFRACTION;
ITO GLASS;
OPTICAL CONDUCTIVITY;
OXIDE FILMS;
REFRACTIVE INDEX;
SCANNING ELECTRON MICROSCOPY;
SELENIUM COMPOUNDS;
THIN FILMS;
TIN;
TIN OXIDES;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
CONDUCTIVE FILMS;
|
|
EID: 80054681325
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2011.09.003 Document Type: Article |
|
Times cited : (20)
|
|
References (25)
|
