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Volumn 8110, Issue , 2011, Pages
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Physical properties of Al-doped MgZnO film grown by RF magnetron sputtering using ZnO/MgO/Al2O3 target
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Author keywords
Al2O3; MgO; Sputtering system; Transparent conductive oxide; Transparent performance; X ray diffraction; X ray photoelectron spectroscopy; ZnO
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Indexed keywords
MGO;
SPUTTERING SYSTEM;
TRANSPARENT CONDUCTIVE OXIDES;
TRANSPARENT PERFORMANCE;
ZNO;
ABSORPTION SPECTROSCOPY;
ANNEALING;
DIFFRACTION;
GALVANOMAGNETIC EFFECTS;
HALL MOBILITY;
MAGNETRON SPUTTERING;
OXYGEN;
OXYGEN VACANCIES;
PHOTOELECTRICITY;
PHOTOELECTRON SPECTROSCOPY;
PHOTONS;
PHYSICAL PROPERTIES;
SEMICONDUCTOR DOPING;
THIN FILMS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZINC;
ZINC OXIDE;
ALUMINUM;
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EID: 80054060449
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.891269 Document Type: Conference Paper |
Times cited : (6)
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References (6)
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