Fabrication and characterization of amorphous In-Zn-O/SiOx/n-Si heterojunction solar cells

Solar Energy

Volumn 85, Issue 11, 2011, Pages 2589-2594

  Fang, Hau Wei ^a   Liu, Shiu Jen ^b   Hsieh, Tsung Eong ^a   Juang, Jenh Yih ^a   Hsieh, Jang Hsing ^c  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

^c MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Amorphous In Zn O film; Photovoltaic characteristics; Pulsed laser deposition; Semiconductor insulator semiconductor solar cell

Indexed keywords

FILL FACTOR; HETEROJUNCTION SOLAR CELLS; HIGH TRANSPARENCY; LASER POWER; LOW RESISTIVITY; PHOTOVOLTAIC CHARACTERISTICS; SEMICONDUCTOR-INSULATOR-SEMICONDUCTOR SOLAR CELL; SI SUBSTRATES; VISIBLE-WAVELENGTH RANGE;

CONVERSION EFFICIENCY; HETEROJUNCTIONS; OPEN CIRCUIT VOLTAGE; PULSED LASER DEPOSITION; PULSED LASERS; SEMICONDUCTOR LASERS; SILICON; SILICON COMPOUNDS; SOLAR POWER GENERATION; ZINC;

AMORPHOUS FILMS;

AMORPHOUS MEDIUM; CELL ORGANELLE; OXIDE; PHOTOVOLTAIC SYSTEM; SOLAR RADIATION;

EID: 80053973149     PISSN: 0038092X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solener.2011.07.016     Document Type: Article

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