SiOx(C)/SiNx dual-layer anti-reflectance film coating for improved cell efficiency

Solar Energy

Volumn 85, Issue 11, 2011, Pages 3057-3063

  Zhou, Chunlan ^a   Li, Tao ^a   Song, Yang ^b   Zhou, Su ^a,b   Wang, Wenjing ^a   Zhao, Lei ^a   Li, Hailing ^a   Tang, Yehua ^a   Diao, Hongwei ^a   Gao, Zhihua ^b   Duan, Ye ^b   Li, Youzhong ^b  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (China)

^b Chinalight Solar Co Ltd   (China)

Author keywords

Laser doping; Over plating; Selective emitter; Solar cell

Indexed keywords

ANNEALING TEMPERATURES; ANTI REFLECTIVE COATINGS; ANTI-REFLECTANCE; CELL EFFICIENCY; COMMERCIAL GRADE; CURRENT DRIVING; DOUBLE LAYERS; DUAL LAYER; FILM COATINGS; LASER DOPING; LOW REFRACTIVE INDEX; METAL REDUCTION; MULTI-CRYSTALLINE SILICON; MULTICRYSTALLINE SILICON WAFERS; OVER-PLATING; P-TYPE; SELECTIVE EMITTERS; SIMULATION STUDIES;

DIELECTRIC DEVICES; DIELECTRIC FILMS; POLYSILICON; REFLECTION; REFLECTIVE COATINGS; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SILICON NITRIDE; SILICON WAFERS; SILVER; SILVER PLATING;

SILICON OXIDES;

ANNEALING; CARBON; FUEL CELL; REFLECTANCE; SILICON; STOICHIOMETRY; SUBSTRATE;

EID: 80053946159     PISSN: 0038092X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solener.2011.09.007     Document Type: Article

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