Tailoring the optical properties of MgxZn1-xO thin films by nitrogen doping

Applied Physics A: Materials Science and Processing

Volumn 104, Issue 3, 2011, Pages 889-893

  Epurescu, G ^a   Birjega, R ^a   Galca, A C ^b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

DEGREE OF CRYSTALLINITY; DIELECTRIC FUNCTIONS; ENERGY DENSITY; INCIDENT BEAMS; MG CONCENTRATIONS; N-DOPED; ND : YAG LASERS; NITROGEN-DOPING; RADIO FREQUENCY PLASMA; REPETITION RATE; RF-POWER; VISIBLE SPECTRAL RANGE; XRD; ZNO;

CONCENTRATION (PROCESS); NEODYMIUM LASERS; NITROGEN; OXYGEN; PLASMA DEPOSITION; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; STOICHIOMETRY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

SEMICONDUCTOR DOPING;

EID: 80053898731     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-011-6433-x     Document Type: Article

References (24)

1. A. Janotti, C.G. Van deWalle, Rep. Prog. Phys. 72, 126501 (2009).
2. T. Minami, T. Miyata, Thin Solid Films 517, 147 (2008).
3. M. Stamataki, I. Fasaki, G. Tsonos, D. Tsamakis, M. Kompitsas, Thin Solid Films 518, 1326 (2009).
4. J. Narayan, K. Dovidenko, A.K. Sharma, S. Oktyabrasky, J. Appl. Phys. 84, 2597 (1998).
5. A. Ohtomo, M. Kawasaki, Y. Sakurai, I. Ohkubo, R. Shiroki, Y. Yoshida, T. Yasuda, Y. Segawa, H. Koinuma, Mater. Sci. Eng. B, Solid-State Mater. Adv. Technol. 56, 263 (1998).
6. J. Zuñiga-Perez, V. Muñoz-Sanjose, M. Lorenz, G. Benndorf, S. Heitsch, D. Spemann, M. Grundmann, J. Appl. Phys. 99, 023514 (2006).
7. R.A. Synowicki, Phys. Status Solidi C 5, 1085 (2008).
8. A. Ohmoto, M. Kawasaki, T. Koida, K. Masubuchi, H. Koinuma, Y. Sakurai, Y. Yoshida, T. Yasuda, Y. Segawa, Appl. Phys. Lett. 72, 2466 (1998).
9. G. Epurescu, G. Dinescu, A. Moldovan, S. Canulescu, R. Birjega, F. Dipietrantonio, E. Verona, P. Verardi, L.C. Nistor, C. Ghica, G. Van Tendeloo, M. Dinescu, Superlattices Microstruct. 42, 79 (2007).
10. H. Fujiwara, Spectroscopic Ellipsometry-Principles and Applications (Wiley, Chichester, 2007).
11. F. Yakuphanoglu, S. Ilican, M. Caglar, Y. Caglar, J. Optoelectron. Adv. Mater. 9, 2180 (2007).
12. A.C. Galca, M. Secu, A. Vlad, J.D. Pedarnig, Thin Solid Films 518, 4603 (2010).
13. V. Srikant, D.R. Clarke, J. Appl. Phys. 83, 5447 (1988).
14. C. Jagadish, S.J. Pearton (eds.): Zinc Oxide Bulk, Thin Films and Nanostructures-Processing, Properties and Applications (Elsevier, Amsterdam, 2006).
15. K. Takahashi, A. Yoshikawa, A. Sandhu (eds.): Wide Bandgap Semiconductors (Springer, Berlin, 2007).
16. R. Kavitha, V. Jayaram, J. Electron. Mater. 36, 1326 (2007).
17. C. Jagadish, S.J. Pearton (eds.): Zinc Oxide Bulk, Thin Films and Nanostructures-Processing, Properties and Applications (Elsevier, Amsterdam, 2006).
18. J.L. Lyons, A. Janotti, C.G. Van de Walle, Appl. Phys. Lett. 95, 252105 (2009).
19. E. Burstein, Phys. Rev. 93, 632 (1954).
20. T.S. Moss, Proc. Phys. Soc. Lond. 67, 775 (1964).
21. L. Cauchy, Bull. Des Sci. Math. 14, 6 (1830).
22. H. Yoshikawa, S. Adachi, Jpn. J. Appl. Phys. 36, 6237 (1997).
23. W.L. Bond, J. Appl. Phys. 36, 1674 (1965).
24. A.C. Galca, E.S. Kooij, H. Wormeester, C. Salm, V. Leca, J.H. Rector, B. Poelsema, J. Appl. Phys. 94, 4296 (2003).