Halogen bonding motifs in polyhedral phenylsilsesquioxanes: Effects of systematic variations in geometry or substitution

Crystal Growth and Design

Volumn 11, Issue 10, 2011, Pages 4360-4367

  Roll, Mark F ^a,b   Kampf, Jeffrey W ^a   Laine, Richard M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b UNIVERSITY OF IDAHO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLUSTER GEOMETRIES; HALOGEN BONDING; HOMOLOGOUS SERIES; NANOBUILDING BLOCKS; PACKING MOTIFS; POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; SHORT CONTACTS; SILSESQUIOXANES; SYSTEMATIC VARIATION; THREE-DIMENSIONAL MOTIFS; THREE-DIMENSIONAL PACKING; TUNABLE MATERIALS;

OLIGOMERS; ORGANIC COATINGS; THREE DIMENSIONAL;

HALOGEN ELEMENTS;

EID: 80053493580     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg200312g     Document Type: Article

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