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Applied Physics Letters

Volumn 99, Issue 12, 2011, Pages

Emission and absorption cross-sections of an Er:GaN waveguide prepared with metal organic chemical vapor deposition

(6) Wang, Q a Dahal, R b Feng, I W b Lin, J Y b Jiang, H X b Hui, R a

a University of Kansas (United States)

b Texas Tech University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION CROSS-SECTION; EMISSION CROSS-SECTION; EQUATION BASED; ERBIUM DOPED;

CARRIER LIFETIME; CONVERSION EFFICIENCY; ERBIUM; GALLIUM NITRIDE; INDUSTRIAL CHEMICALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS;

WAVEGUIDES;

EID: 80053404464 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3636418 Document Type: Article

Times cited : (14)

References (13)

1
- 0003839607
- (John Wiley Sons, Hoboken NJ).
- E. Desurvire, Erbium-doped Fibre Amplifiers: Principles and Applications (John Wiley Sons, Hoboken NJ, 1994).
- (1994) Erbium-doped Fibre Amplifiers: Principles and Applications
- Desurvire, E.¹

2
- 0023418090
- 10.1049/el:19870719
- R. J. Mears, L. Reekie, I. M. Jauncey, and D. N. Payne, Electron. Lett. 23, 1026 (1987). 10.1049/el:19870719
- (1987) Electron. Lett. , vol.23 , pp. 1026
- Mears, R.J.¹ Reekie, L.² Jauncey, I.M.³ Payne, D.N.⁴

3
- 0003912631
- (Academic, San Diego, CA).
- P. C. Becker, N. A. Olsson, and J. R. Simpson, Erbium-Doped Fibre Amplifiers: Fundamentals and Technology (Academic, San Diego, CA, 1999).
- (1999) Erbium-Doped Fibre Amplifiers: Fundamentals and Technology
- Becker, P.C.¹ Olsson, N.A.² Simpson, J.R.³

4
- 0344890359
- (Kluwer Academic, Dordrecht, The Netherlands).
- M. J. Connelly, Semiconductor Optical Amplifiers (Kluwer Academic, Dordrecht, The Netherlands, 2002).
- (2002) Semiconductor Optical Amplifiers
- Connelly, M.J.¹

5
- 33846942950
- 10.1063/1.2450641
- C. Ugolini, N. Nepal, J. Y. Lin, H. X. Jiang, and J. M. Zavada, Appl. Phys. Lett. 90, 051110 (2007). 10.1063/1.2450641
- (2007) Appl. Phys. Lett. , vol.90 , pp. 051110
- Ugolini, C.¹ Nepal, N.² Lin, J.Y.³ Jiang, H.X.⁴ Zavada, J.M.⁵

6
- 78650373698
- 10.1063/1.3527089
- Q. Wang, R. Hui, R. Dahal, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 97, 241105 (2010). 10.1063/1.3527089
- (2010) Appl. Phys. Lett. , vol.97 , pp. 241105
- Wang, Q.¹ Hui, R.² Dahal, R.³ Lin, J.Y.⁴ Jiang, H.X.⁵

7
- 0342305468
- 10.1103/PhysRev.134.A299
- D. E. McCumber, Phys. Rev. 134, A299 (1964). 10.1103/PhysRev.134.A299
- (1964) Phys. Rev. , vol.134 , pp. 299
- McCumber, D.E.¹

8
- 84975575697
- 10.1364/OL.16.000258
- W. J. Miniscalco and R. S. Quimby, Opt. Lett. 16, 258 (1991). 10.1364/OL.16.000258
- (1991) Opt. Lett. , vol.16 , pp. 258
- Miniscalco, W.J.¹ Quimby, R.S.²

9
- 0032205445
- 10.1088/0963-9659/7/6/014
- J. A. Lzaro, J. A. Valles, and M. A. Rebolledo, Pure Appl. Opt. 7, 1363 (1998). 10.1088/0963-9659/7/6/014
- (1998) Pure Appl. Opt. , vol.7 , pp. 1363
- Lzaro, J.A.¹ Valles, J.A.² Rebolledo, M.A.³

10
- 80053431547
- 10.1007/978-90-481-2877-8-5
- R. Dahal, J. Y. Lin, H. X. Jiang, and J. M. Zavada, Top. Appl. Phys. 124, 115 (2010). 10.1007/978-90-481-2877-8-5
- (2010) Top. Appl. Phys. , vol.124 , pp. 115
- Dahal, R.¹ Lin, J.Y.² Jiang, H.X.³ Zavada, J.M.⁴

11
- 0026104978
- 10.1109/50.65882
- W. J. Miniscalco, IEEE J. Lightwave Technol. 9, 234 (1991). 10.1109/50.65882
- (1991) IEEE J. Lightwave Technol. , vol.9 , pp. 234
- Miniscalco, W.J.¹

12
- 79955546730
- 10.1016/j.optmat.2010.07.007
- N. Woodward, V. Dierolf, J. Y. Lin, H. X. Jiang, and J. M. Zavada, Opt. Mater. 33, 1059 (2011). 10.1016/j.optmat.2010.07.007
- (2011) Opt. Mater. , vol.33 , pp. 1059
- Woodward, N.¹ Dierolf, V.² Lin, J.Y.³ Jiang, H.X.⁴ Zavada, J.M.⁵

13
- 0028425055
- 10.1049/el:19940579
- C. Y. Chen, S. Wen, and S. Chi, Electron. Lett. 30, 889 (1994). 10.1049/el:19940579
- (1994) Electron. Lett. , vol.30 , pp. 889
- Chen, C.Y.¹ Wen, S.² Chi, S.³

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