Comparative study of the superhydrophobic-modification of silicone rubber surfaces by CF4 ICP and CCP

Plasma Processes and Polymers

Volumn 6, Issue 8, 2009, Pages 530-536

  Gao, Song Hua ^a,b   Zhou, Ke Sheng ^b   Lei, Ming Kai ^c   Wen, Li Shi ^b,c,d  

^a Sanmlng University   (China)

^b CENTRAL SOUTH UNIVERSITY   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^d INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Afm; cf4 icp and ccp; Silicon rubber; Superhydrophobic modification; Surface modification; XPS

Indexed keywords

AFM; SILICON RUBBERS; SUPERHYDROPHOBIC; SURFACE MODIFICATION; XPS;

ANGLE MEASUREMENT; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; ELASTOMERS; ELECTRIC INSULATORS; FLUORINE; FLUORINE CONTAINING POLYMERS; HYDROPHOBICITY; INDUCTIVELY COUPLED PLASMA; NANOFLUIDICS; RUBBER; SILICON; SILICONES; SURFACE CHEMISTRY; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE TREATMENT;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70450216538     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800213     Document Type: Article

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