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Volumn 321, Issue , 2011, Pages 234-239
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Edge isolation using ultra-short pulse laser materials with a top-hat beam profile
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Author keywords
Edge isolation; Silicon solar cells; Top hat; Ultra short pulse laser
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Indexed keywords
BEAM PROFILES;
COMPARATIVE STUDIES;
CRYSTALLINE SILICON SOLAR CELLS;
EDGE ISOLATION;
ELECTRICAL PERFORMANCE;
GAUSSIANS;
INDUSTRIAL SOLUTIONS;
ISOLATION PROCESS;
LASER FOCUS;
LASER GROOVING;
LASER PULSE WIDTH;
LASER WAVELENGTH;
MATERIAL REMOVAL;
SOLAR CELL JUNCTIONS;
TOP-HAT;
ULTRA-SHORT PULSE LASER;
CELL MEMBRANES;
GAUSSIAN BEAMS;
INDUSTRIAL RESEARCH;
INTELLIGENT MATERIALS;
LASER DAMAGE;
MECHANICAL ENGINEERING;
SILICON SOLAR CELLS;
ULTRASHORT PULSES;
NANOSTRUCTURED MATERIALS;
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EID: 80053199056
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/AMR.321.234 Document Type: Conference Paper |
Times cited : (1)
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References (14)
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