-
1
-
-
35349030971
-
-
Y. Sun, Y. Qiu, A. Nie, and X. Wang, IEEE Trans. Plasma Sci. 35, 1496 (2007).
-
(2007)
IEEE Trans. Plasma Sci.
, vol.35
, pp. 1496
-
-
Sun, Y.1
Qiu, Y.2
Nie, A.3
Wang, X.4
-
2
-
-
32444433786
-
-
C. Tendero, C. Tixier, P. Tristant, J. Desmaison, and P. Leprince, Spectrochim. Acta, Part B 61, 2 (2006) .
-
(2006)
Spectrochim. Acta Part B
, vol.61
, pp. 2
-
-
Tendero, C.1
Tixier, C.2
Tristant, P.3
Desmaison, J.4
Leprince, P.5
-
6
-
-
18844424704
-
-
M. Teschke, J. Kedzierski, E. G. Finantu-Dinu, D. Korzec, and J. Engenmann, IEEE Trans. Plasma Sci. 33, 310 (2005).
-
(2005)
IEEE Trans. Plasma Sci.
, vol.33
, pp. 310
-
-
Teschke, M.1
Kedzierski, J.2
Finantu-Dinu, E.G.3
Korzec, D.4
Engenmann, J.5
-
7
-
-
0035648097
-
-
J. Janca, L. Zajickova, M. Klima, and P. Slavicek, Plasma Chem. Plasma Proc. 21, 565 (2001).
-
(2001)
Plasma Chem. Plasma Proc.
, vol.21
, pp. 565
-
-
Janca, J.1
Zajickova, L.2
Klima, M.3
Slavicek, P.4
-
8
-
-
0000127319
-
-
H. W. Merrmann, I. Henins, J. Park, and G. S. Selwyn, Phys. Plasmas 6, 2284 (1999).
-
(1999)
Phys. Plasmas
, vol.6
, pp. 2284
-
-
Merrmann, H.W.1
Henins, I.2
Park, J.3
Selwyn, G.S.4
-
9
-
-
53349127897
-
-
A. V. Pipa, T. Bindemann, R. Foest, E. Kindel, J. Ropcke, and K.-D. Weltmann, J. Phys. D: Appl. Phys. 41, 194011 (2007).
-
(2007)
J. Phys. D: Appl. Phys.
, vol.41
, pp. 194011
-
-
Pipa, A.V.1
Bindemann, T.2
Foest, R.3
Kindel, E.4
Ropcke, J.5
Weltmann, K.-D.6
-
12
-
-
55849133398
-
-
A. Shashurin, M. Keidar, S. Bronnikov, R. A. Jurjus, and M. A. Stepp, Appl. Phys. Lett. 93, 181501 (208).
-
Appl. Phys. Lett.
, vol.93
, Issue.208
, pp. 181501
-
-
Shashurin, A.1
Keidar, M.2
Bronnikov, S.3
Jurjus, R.A.4
Stepp, M.A.5
-
13
-
-
49149122329
-
-
C. Oliveira, J. A. S. Correa, M. P. Gomes, B. N. Sismanoglu, and J. Amorim, Appl. Phys. Lett. 93, 041503 (2008).
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 041503
-
-
Oliveira, C.1
Correa, J.A.S.2
Gomes, M.P.3
Sismanoglu, B.N.4
Amorim, J.5
-
14
-
-
0032138693
-
-
J. Y. Jeong, S. E. Babayn, V. J. Tu, J. Park, I. Henins, R. F. Hicks, and G. S. Selwyn, Plasma Sources Sci. Technol. 7, 282 (1998).
-
(1998)
Plasma Sources Sci. Technol.
, vol.7
, pp. 282
-
-
Jeong, J.Y.1
Babayn, S.E.2
Tu, V.J.3
Park, J.4
Henins, I.5
Hicks, R.F.6
Selwyn, G.S.7
-
15
-
-
53349099687
-
-
N. Knake, K. Niemi, and S. Reuter, V. Schulz-von der Gathen, and J. Winter, Appl. Phys. Lett. 93, 131503 (2008).
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 131503
-
-
Knake, N.1
Niemi, K.2
Reuter, S.3
Schulz-Von Der Gathen, V.4
Winter, J.5
-
21
-
-
0037107363
-
-
M. Miclea, K. Kunze, J. Franzke, and K. Niemax, Spectrochim. Acta, Part B 57, 1585 (2002).
-
(2002)
Spectrochim. Acta Part B
, vol.57
, pp. 1585
-
-
Miclea, M.1
Kunze, K.2
Franzke, J.3
Niemax, K.4
-
24
-
-
79951905016
-
-
C. Meyer, R. Heming, E. L. Gurevich, U. Marggraf, M. Oksuss, S. Florek, and J. Franzke, J. Anal. At. Spectrom. 26, 505 (2011).
-
(2011)
J. Anal. At. Spectrom.
, vol.26
, pp. 505
-
-
Meyer, C.1
Heming, R.2
Gurevich, E.L.3
Marggraf, U.4
Oksuss, M.5
Florek, S.6
Franzke, J.7
-
26
-
-
34547453155
-
-
M. Miclea, M. Okruss, K. Kunze, N. Ahlman, and J. Franzke, Anal. Bioanal. Chem. 388, 1565 (2007).
-
(2007)
Anal. Bioanal. Chem.
, vol.388
, pp. 1565
-
-
Miclea, M.1
Okruss, M.2
Kunze, K.3
Ahlman, N.4
Franzke, J.5
-
28
-
-
33645950414
-
-
S. Shakir, S. Mynampati, B. Pashaie, and S. K. Dhali, J. Appl. Phys. 99, 073303 (2006).
-
(2006)
J. Appl. Phys.
, vol.99
, pp. 073303
-
-
Shakir, S.1
Mynampati, S.2
Pashaie, B.3
Dhali, S.K.4
-
29
-
-
33750600944
-
-
A. Sublet, C. Ding, J.-L. Dorier, Ch. Hollestein, P. Fayet, and F. Coursimault, Plasma Sources Sci. Technol. 15, 627 (2006).
-
(2006)
Plasma Sources Sci. Technol.
, vol.15
, pp. 627
-
-
Sublet, A.1
Ding, C.2
Dorier, J.-L.3
Hollestein, Ch.4
Fayet, P.5
Coursimault, F.6
-
30
-
-
80052936335
-
-
accessed July 2010
-
http://www.rfcafe.com/references/electrical/dielectric-constants- strengths. htm (accessed July 2010).
-
-
-
-
34
-
-
33947125454
-
-
R. Brandeburg, J. Ehlbeck, M. Stieber, T. Woedtke, J. Zeymer, O. Schluter, and K.-D. Weltmann, Contrib. Plasma Phys. 47, 72 (2007).
-
(2007)
Contrib. Plasma Phys.
, vol.47
, pp. 72
-
-
Brandeburg, R.1
Ehlbeck, J.2
Stieber, M.3
Woedtke, T.4
Zeymer, J.5
Schluter, O.6
Weltmann, K.-D.7
-
36
-
-
21044436452
-
-
R. Rahul, O. Stan, A. Rahman, E. Littlefield, K. Hoshimiya, A. P. Yalin, A. Sharma, A. Pruden, C. A. Moore, Z. Yu, and G. J. Collins, J. Phys. D: Appl. Phys. 38, 1750 (2205).
-
(2205)
J. Phys. D: Appl. Phys.
, vol.38
, pp. 1750
-
-
Rahul, R.1
Stan, O.2
Rahman, A.3
Littlefield, E.4
Hoshimiya, K.5
Yalin, A.P.6
Sharma, A.7
Pruden, A.8
Moore, C.A.9
Yu, Z.10
Collins, G.J.11
-
37
-
-
84870588772
-
-
accessed November 2010
-
NIST database, http://www.nist.gov/pml/data/asd.cfm (accessed November 2010).
-
NIST Database
-
-
|