Enhanced performance of dye-sensitized solar cell via surface modification of mesoporous TiO2 photoanode with electrodeposited thin TiO 2 layer

Electrochimica Acta

Volumn 56, Issue 24, 2011, Pages 8906-8911

  Wu, Mao Sung ^a   Tsai, Chen Hsiu ^a   Jow, Jiin Jiang ^a   Wei, Tzu Chien ^b  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b Tripod Technology Corporation   (Taiwan)

Author keywords

Anodic electrodeposition; Charge recombination; Dye sensitized solar cells; Surface modification; TiO2 photoanode

Indexed keywords

ANODIC ELECTRODEPOSITION; CHARGE RECOMBINATIONS; DYE-SENSITIZED SOLAR CELL; DYE-SENSITIZED SOLAR CELLS; ELECTRICAL CONTACTS; ELECTROCHEMICAL ROUTES; ELECTRON TRANSPORT; ENHANCED PERFORMANCE; MESOPOROUS TIO; PHOTO-ANODES; PHOTOANODE; PHOTOELECTRON CONVERSION; POROUS TIO; SURFACE AREA; TIO;

CONVERSION EFFICIENCY; ELECTRODEPOSITION; ELECTROLYTES; PHOTOELECTROCHEMICAL CELLS; SURFACE TREATMENT; TIN; TIN OXIDES; TITANIUM DIOXIDE;

SOLAR CELLS;

EID: 80052820986     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.07.105     Document Type: Article

References (40)

1. P.J. Cameron, L.M. Peter, and S. Hore J. Phys. Chem. B 109 2005 930
2. S. Ito, P. Liska, P. Comte, R. Charvet, P. Péchy, U. Bach, L. Schmidt-Mende, S.M. Zakeeruddin, A. Kay, M.K. Nazeeruddin, and M. Grätzel Chem. Commun. 2005 4351
3. S. Hore, and R. Kern Appl. Phys. Lett. 87 2005 263504
4. J.N. Hart, D. Menzies, Y.B. Cheng, G.P. Simon, and L. Spiccia C. R. Chim. 9 2006 622
5. K.S. Ahn, M.S. Kang, J.K. Lee, B.C. Shin, and J.W. Lee Appl. Phys. Lett. 89 2006 013103
6. J. Xia, N. Masaki, K. Jiang, and S. Yanagida Chem. Commun. 2007 138
7. S. Lee, J.H. Noh, H.S. Han, D.K. Yim, D.H. Kim, J.K. Lee, J.Y. Kim, H.S. Junh, and K.S. Hong J. Phys. Chem. C 113 2009 6878
8. K. Miettunen, J. Halme, P. Vahermaa, T. Saukkonen, M. Toivola, and P. Lunda J. Electrochem. Soc. 156 2009 B876
9. B. Yoo, K. Kim, D.K. Lee, M.J. Ko, H. Lee, Y.H. Kim, W.M. Kim, and N.G. Park J. Mater. Chem. 20 2010 4392
10. S.Q. Fan, B. Fang, H. Choi, S. Paik, C. Kim, B.S. Jeong, J.J. Kim, and J. Ko Electrochim. Acta 55 2010 4642
11. H.F. Wang, L.Y. Chen, W.N. Su, J.C. Chung, and B.J. Hwang J. Phys. Chem. C 114 2010 3185
12. P.M. Sommeling, B.C. O'Regan, R.R. Haswell, H.J.P. Smit, N.J. Bakker, J.J.T. Smits, J.M. Kroon, and J.A.M. van Roosmalen J. Phys. Chem. B 110 2006 19191
13. B.C. O'Regan, J.R. Durrant, P.M. Sommeling, and N.J. Bakker J. Phys. Chem. C 111 2007 14001
14. W. Xu, S. Dai, L. Hu, C. Zhang, S. Xiao, X. Luo, W. Jing, and K. Wang Plasma Sci. Technol. 9 2007 556
15. P. Roy, D. Kim, I. Paramasivam, and P. Schmuki Electrochem. Commun. 11 2009 1001
16. L. Vesce, R. Riccitelli, G. Soscia, T.M. Brown, A.D. Carlo, and A. Reale J. Non-Cryst. Solids 356 2010 1958
17. D. Kim, P. Roy, K. Lee, and P. Schmuki Electrochem. Commun. 12 2010 574
18. G.D. Sharma, P. Suresh, and J.A. Mikroyannidis Electrochim. Acta 55 2010 2368
19. P. Charoensirithavorn, Y. Ogomi, T. Sagawa, S. Hayase, and S. Yoshikawa J. Electrochem. Soc. 157 2010 B354
20. D.B. Menzies, Q. Dai, L. Bourgeois, R.A. Caruso, Y.B. Cheng, G.P. Simon, and L. Spiccia Nanotechnology 18 2007 125608
21. H. Yu, S. Zhang, H. Zhao, B. Xue, P. Liu, and G. Will J. Phys. Chem. C 113 2009 16277
22. S.H. Kang, J.Y. Kim, Y. Kim, H.S. Kim, and Y.E. Sung J. Phys. Chem. C 111 2007 9614
23. S. Wu, H. Han, Q. Tai, J. Zhang, B.L. Chen, S. Xu, C. Zhou, Y. Yang, H. Hu, and X.Z. Zhao Appl. Phys. Lett. 92 2008 122106
24. J.H. Yum, S. Nakade, D.Y. Kim, and S. Yanagida J. Phys. Chem. B 110 2006 3215
25. S. Wu, H. Han, Q. Tai, J. Zhang, S. Xu, C. Zhou, Y. Yang, H. Hu, B.L. Chen, B. Sebo, and X.Z. Zhao Nanotechnology 19 2008 215704
26. Z. Liu, K. Pan, M. Liu, M. Wang, Q. Lü, J. Li, Y. Bai, and T. Li Electrochim. Acta 50 2005 2583
27. H. Alarcón, M. Hedlund, E.M.J. Johansson, H. Rensmo, A. Hagfeldt, and G. Boshloo J. Phys. Chem. C 111 2007 13267
28. S. Wu, H. Han, Q. Tai, J. Zhang, S. Xu, C. Zhou, Y. Yang, H. Hu, B.L. Chen, and X.Z. Zhao J. Power Sources 182 2008 119
29. X. Wei, T. Xie, Y. Zhang, D. Wang, and J. Chen Mater. Chem. Phys. 122 2010 259
30. M.S. Wu, C.H. Tsai, and T.C. Wei Chem. Commun. 47 2011 2871
31. L. Kavan, B. O'Regan, A. Kay, and M. Grätzel J. Electroanal. Chem. 346 1993 291
32. K. Wessels, A. Feldhoff, M. Wark, J. Rathousky, and T. Oekermann Electrochem. Solid-State Lett. 9 2006 C93
33. M.S. Wu, M.J. Wang, J.J. Jow, W.D. Yang, C.Y. Hsieh, and H.M. Tsai J. Power Sources 185 2008 1420
34. T.C. Wei, C.C. Wan, and Y.Y. Wang Appl. Phys. Lett. 88 2006 103122
35. G. Kantonis, T. Stergiopoulos, A.P. Katsoulidis, P.J. Pomonis, and P. Falaras J. Photochem. Photobiol. A: Chem. 217 2011 236
36. P.R.F. Barnes, A.Y. Anderson, S.E. Koops, J.R. Durrant, and B.C. O'Regan J. Phys. Chem. C 113 2009 1126
37. Q. Wang, S. Ito, M. Grätzel, F. Fabregat-Santiago, I. Mora-Seró, J. Bisquert, T. Bessho, and H. Ima J. Phys. Chem. B 110 2006 25210
38. B.H. Lee, M.Y. Song, S.Y. Jang, S.M. Jo, S.Y. Kwak, and D.Y. Kim J. Phys. Chem. C 113 2009 21453
39. T. Hoshikawa, M. Yamada, R. Kikuchi, and K. Eguchi J. Electrochem. Soc. 152 2005 E68
40. F. Fabregat-Santiago, J. Bisquert, E. Palomares, L. Otero, D. Kuang, S.M. Zakeeruddin, and M. Grätzel J. Phys. Chem. C 111 2007 6550