Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films

AIP Advances

Volumn 1, Issue 2, 2011, Pages

  Zhao, Y L ^a   Barman, A Roy ^a   Dhar, S ^a   Annadi, A ^a   Motapothula, M ^a   Wang, Jinghao ^b   Su, Haibin ^b   Breese, M ^a   Venkatesan, T ^a   Wang, Q ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 80052806127     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.3609927     Document Type: Article

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