Effect of nitrogen addition on the morphology, magnetic and magnetoresistance properties of electrodeposited Co, Ni and Co-Ni granular thin films onto aluminum substrates

Materials Chemistry and Physics

Volumn 130, Issue 1-2, 2011, Pages 327-333

  Tanase, S I ^a,b   Pinzaru, D ^a   Pascariu, P ^a   Dobromir, M ^a   Sandu, A V ^c   Georgescu, V ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b Alexandru Cel Bun College   (Romania)

^c GHEORGHE ASACHI TECHNICAL UNIVERSITY OF IASI   (Romania)

Author keywords

Magnetic properties; Thin films; Torsion magnetometer; X ray photo emission spectroscopy (XPS)

Indexed keywords

ALUMINUM SUBSTRATE; GRANULAR FILM; GRANULAR MORPHOLOGY; GRANULAR THIN FILMS; MAGNETORESISTANCE PROPERTIES; MAGNETORESISTANCE RATIO; NITROGEN ADDITIONS; NITROGEN CONTENT; SPIN TUNNELING; TUNNELING MAGNETORESISTANCE; X RAY PHOTOEMISSION SPECTROSCOPY;

ALUMINUM; ALUMINUM COATINGS; COBALT; ELECTRIC RESISTANCE; ELECTRODEPOSITION; EMISSION SPECTROSCOPY; MAGNETIC PROPERTIES; MAGNETOELECTRONICS; MAGNETORESISTANCE; MORPHOLOGY; NITROGEN; SUBSTRATES; THIN FILMS;

FILM PREPARATION;

EID: 80052572919     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2011.06.055     Document Type: Article

References (49)

1. A.E. Berkowitz, J.R. Mitekell, M.J. Corey, A.P. Young, S. Zhang, F.E. Spada, F.T. Parker, A. Hutten, and G. Thomas Phys. Rev. Lett. 68 1992 3745 3746
2. J.Q. Xiao, J.S. Jiang, and C.L. Chien Phys. Rev. Lett. 68 1992 3749 3751
3. K. Takanashi, T. Sugawara, K. Hono, and H. Fujimori J. Appl. Phys. 76 1994 6790
4. K. Takanashi, J. Park, T. Sugawara, K. Hono, A. Goto, H. Yasuoka, and H. Fujimori Thin Solid Films 275 1996 106
5. M. Julliere Phys. Lett. A 54 1975 225 226
6. J.Q. Xiao, J.S. Jiang, and C.L. Chien Phys. Rev. B 46 1992 9266
7. P. Xiong, G. Xiao, J.Q. Wang, J.Q. Xiao, J.S. Jiang, and C.L. Chien Phys. Rev. Lett. 69 1992 3220
8. C. Wang, Y. Zhang, X. Xiao, H. Hu, and Y. Rong Phys. Stat. Sol. 203 2006 973 976
9. O. Chayka, L. Kraus, P. Lobotka, V. Sechovsky, T. Kocourek, and M. Jelinek J. Magn. Magn. Mater. 300 2006 293 299
10. T. Miyazaki, and N. Tezuka J. Magn. Magn. Mater. 151 1995 403
11. H. Fujimori, S. Mitani, and S. Ohnuma J. Magn. Magn. Mater. 156 1996 311
12. H. Fujimori, S. Mitani, and S. Ohnuma Mater. Sci. Eng. B 31 1995 219
13. F. Spizzo, E. Angeli, D. Bisero, F. Ronconi, P. Vavassori, P. Allia, V. Selvaggini, M. Coisson, P. Tiberto, and F. Vinai J. Magn. Magn. Mater. 262 2003 88
14. S. Araki, K. Yasui, and Y. Narumiya J. Phys. Soc. Jpn. 60 1991 2827
15. M. Alper, K. Attenborough, R. Hart, S.J. Lane, D.S. Lashmore, C. Younes, and W. Schwarzacher Appl. Phys. Lett. 63 1994 2484
16. Y. Ueda, and M. Ito Jpn. J. Appl. Phys. 33 Part 2 1994 L1403
17. H.J. Blythe, and V.M. Fedosyuk J. Phys. Condens. Matter 7 1995 3461
18. T. Homma, Y. Kita, and T. Osaka J. Electrochem. Soc. 147 1 2000 160
19. Y. Nakamura J. Magn. Magn. Mater. 200 1999 634
20. J. Casals-Terré, M. Duch, J.A. Plaza, J. Esteve, R. Pérez-Castillejos, E. Vallés, and E. Gómez Sens. Actuators A 147 2008 600 606
21. A. Dolati, M. Sababi, E. Nouri, and M. Ghorbani Mater. Chem. Phys. 102 2007 118 124
22. O. Ergeneman, K.M. Sivaraman, S. Pané, E. Pellicer, A. Teleki, A.M. Hirt, M.D. Baró, and B.J. Nelson Electrochim. Acta 56 2011 1399 1408
23. P. Cojocaru, L. Magagnin, E. Gómez, and E. Vallés J. Alloys Compd. 503 2010 454 459
24. E. Gómez, S. Pané, and E. Vallés Electrochim. Acta 51 2005 146 153
25. K.S. Lew, M. Raja, S. Thanikaikarasan, T. Kim, Y.D. Kim, and T. Mahalingam Mater. Chem. Phys. 112 2008 249 253
26. V. Georgescu, and M. Georgescu J. Magn. Magn. Mater. 242-245 2002 416 419
27. J. Bockris, and J. Kim J. Electrochem. Soc. 143 1996 3801
28. J. Bockris, and J. Kim J. Appl. Electrochem. 27 1997 623
29. S. Ureta, and C. Yanez Electrochim. Acta 42 1997 1725
30. M. Paidar, I. Rousar, and K. Bouzek J. Appl. Electrochem. 29 1999 611
31. A.C.A. Vooysde, R.A. Santenvan, and J.A.R. van Veen J. Mol. Catal. A 154 2000 203
32. K. Bouzek, M. Paidar, A. Sadlikova, and H. Bergmann J. Appl. Electrochem. 31 2001 1185
33. C. Polatides, and G. Kyriacou J. Appl. Electrochem. 35 2005 421 427
34. G.E. Badea Electrochim. Acta 54 2009 1001
35. C. Polatides, M. Dortsiu, and G. Kyriacou Electrochim. Acta 50 2005 5237 5241
36. L.H. Lin, D. Robertson, J. Chambers, and D. Hobbs J. Electrochem. Soc. 135 1998 1154
37. J.D. Genders, D. Hartsough, and D.T. Hobbs J. Appl. Electrochem. 26 1996 1
38. I. Katsounaros, D. Ipsakis, C. Polatides, and G. Kyriacou Electrochim. Acta 52 2006 1329 1338
39. I. Katsounaros, and G. Kyriacou Electrochim. Acta 53 2008 5482 5483
40. Ch. Wang, Zh. Guo, Y. Rong, and T.Y. Hsu J. Magn. Magn. Mater. 277 2004 273
41. T.Y. Chen, S.X. Huang, C.L. Chien, and M.D. Stiles Phys. Rev. Lett. 96 20 2006 207203
42. V.V. Hiep, N. Chau, D.M. Hong, and N.H. Luong J. Magn. Magn. Mater. 310 2007 2525
43. G. Xiao, J.Q. Wang, and P. Xiong IEEE Trans. Magn. 29 6 1993 2695 2696
44. S.I. Tanase, D. Tanase, P. Pascariu, L. Vlad, A.V. Sandu, and V. Georgescu Mater. Sci. Eng. B 167 2010 119 123
45. A. Milchev Electrochim. Acta 42 10 1997 1533 1536
46. A. Milchev Electrocrystallization: Fundamentals of Nucleation and Growth 2002 Kluwer Academic Publishers Springer (Chapter 1 (1.2))
47. Nickel Cobalt and their Alloys ASM Handbook 2000 ASM International p. 358
48. V. Georgescu, C. Ilioaia, and R. Musat J. Optoelectron. Adv. Mater. 7 2005 3063 3067
49. J. Song, A.I. Inamdar, B. Jang, K. Jeon, Y. Kim, K. Jung, Y. Kim, H. Im, W. Jung, H. Kim, and J.P. Hong Appl. Phys. Express 3 2010 091101-1-191101-3