Structural and electronic properties of nitrogen ion implanted ultra nanocrystalline diamond surfaces

Journal of Applied Physics

Volumn 110, Issue 4, 2011, Pages

  Panda, Kalpataru ^a   Sundaravel, B ^a   Panigrahi, B K ^a   Magudapathy, P ^a   Nandagopala Krishna, D ^a   Nair, K G M ^a   Chen, Huang Chin ^b   Lin, I Nan ^b  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^b TAMKANG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT IMAGING; CURRENT VOLTAGE CURVE; DENSITY OF STATE; DIAMOND GRAINS; ELECTRON EMITTERS; ELECTRON FIELD EMISSION; ION IMPLANTED; MICROWAVE PLASMA-ENHANCED CVD; N-IMPLANTATION; NITROGEN IMPLANTATION; TUNNELING SPECTROSCOPY; ULTRA-NANOCRYSTALLINE DIAMOND;

DIAMONDS; ELECTRONIC PROPERTIES; ENERGY GAP; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; NITROGEN; PHOTOELECTRON SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN PLASMA;

EID: 80052414677     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3622517     Document Type: Article

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