Analysis of the supercritical antisolvent mechanisms governing particles precipitation and morphology by in situ laser scattering techniques

Chemical Engineering Journal

Volumn 173, Issue 1, 2011, Pages 258-266

  Braeuer, A ^a   Dowy, S ^a   Torino, E ^a,b   Rossmann, M ^a   Luther, S K ^a   Schluecker, E ^a   Leipertz, A ^a   Reverchon, E ^b  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b UNIVERSITY OF SALERNO   (Italy)

Author keywords

Elastic light scattering; Interface evolution; Micronization; Mixing behavior; Particle formation; Phase behavior; Raman scattering; Supercritical antisolvent process

Indexed keywords

ELASTIC LIGHT SCATTERING; INTERFACE EVOLUTION; MICRONIZATION; MIXING BEHAVIOR; PARTICLE FORMATION; SUPERCRITICAL ANTISOLVENT PROCESS;

CARBON DIOXIDE; ELECTRIC FAULT CURRENTS; FLOW RATE; LIGHT SCATTERING; LIQUIDS; MIXTURES; MORPHOLOGY; PHASE EQUILIBRIA; PHASE INTERFACES; REFRACTION; SCATTERING; SUPERCRITICAL FLUID EXTRACTION; YTTRIUM;

PRECIPITATION (CHEMICAL);

EID: 80052298387     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2011.07.064     Document Type: Article

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