Photolithographic fabrication of solid-liquid core waveguides by thiol-ene chemistry

Journal of Micromechanics and Microengineering

Volumn 21, Issue 9, 2011, Pages

  Sagar, Kaushal ^a   Gopalakrishnan, Nimi ^a   Christiansen, Mads Brøkner ^a   Kristensen, Anders ^a   Ndoni, Sokol ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

DEGREE OF FLEXIBILITY; FABRICATION PROCESS; INTERNAL SURFACE AREA; LIGHT CONFINEMENTS; LIQUID CORE WAVEGUIDE; NANO-POROUS; NANOPOROUS POLYMERS; PHOTO-GRAFTING; POROUS POLYMERS; PROPAGATION LOSS; REACTION CONDITIONS; SOLID-LIQUID; THIOL-ENES;

FABRICATION; FILLED POLYMERS; HYDROPHILICITY; HYDROPHOBICITY; POLYBUTADIENES; POLYMERS; REFRACTIVE INDEX; SURFACE CHEMISTRY; WAVEGUIDES;

LIQUIDS;

EID: 80052195479     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/9/095001     Document Type: Article

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