Electron-emission properties of carbon nanotube micro-tips coated by amorphous carbon nitride films

Thin Solid Films

Volumn 519, Issue 22, 2011, Pages 7899-7903

  Kim, Jong Pil ^a   Noh, Young Rok ^a   Kim, Jong Uk ^b   Park, Jin Seok ^a  

^a Hanyang University   (South Korea)

^b Korea Electrotechnology Research Institute (KERI)   (South Korea)

Author keywords

Amorphous carbon nitrides; Carbon nanotubes; Field emission property; Inductively coupled plasma chemical vapor deposition; Stability

Indexed keywords

AMORPHOUS CARBON NITRIDE FILMS; CNT EMITTERS; ELECTRON EMISSION PROPERTIES; EMISSION CURRENT; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; FIELD EMISSION MEASUREMENTS; FIELD EMISSION PROPERTY; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FIELD EMITTER; HIGH VACUUM; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION; INDUCTIVELY-COUPLED; NANO-SIZED; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM; TUNGSTEN TIP; VAPOR DEPOSITION SYSTEMS;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CARBON NANOTUBES; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; ELECTRONS; ENERGY DISPERSIVE SPECTROSCOPY; FIELD EMISSION; FIELD EMISSION MICROSCOPES; FILM PREPARATION; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INDUCTIVELY COUPLED PLASMA; PHOTOELECTRON SPECTROSCOPY; PLASMA DEPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON EMISSION;

EID: 80052129328     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.05.046     Document Type: Article

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