Electron field emission from diamond and diamond-like carbon for field emission displays

Carbon

Volumn 37, Issue 5, 1999, Pages 759-763

  Robertson, J ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANODES; BAND STRUCTURE; CHEMICAL BONDS; DIAMONDS; ELECTRIC FIELDS; ELECTRON EMISSION; SEMICONDUCTOR MATERIALS;

DIAMOND LIKE CARBON; ELECTRON FIELD EMISSION; FOWLER-NORDHEIM EMISSIONS;

CARBON;

EID: 0032658809     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(98)00267-X     Document Type: Article

References (28)

1. Himpsel F.J., Knapp J.S., VanVechten J.A., Eastman D.E. Phys Rev B. 20:1979;624.
2. Geis M.W.et al. IEEE Trans ED Lett. 12:1991;456.
3. Zhu W., Kochanski G.P., Jin S., Seibles L. J Appl Phys. 78:1995;2707.
4. Okano K., Koizumi S., Silva S.R.P., Amaratunga G.A.J. Nature. 381:1996;140.
5. Geis M.W., Twichell J.C., Lyszczarz T.M. J Vac Sci Technol B. 14:1996;2060.
6. Talin A.A., Pan L.S., McCarty K.F., Doerr H.J., Bunshah R.F. Appl Phys Lett. 69:1996;3842.
7. Zhu W. Presented at Diamond Films '97. Edinburgh, UK.
8. Amaratunga G.A.J., Silva S.R.P. App Phys Lett. 68:1996;2529.
9. Satyanarayana B.S., Hart A., Milne W.I., Robertson J. App Phys Lett. 71:1997;1430.
10. Coll B.F., Jaskie J.E., Markham J.L., Menu E.P., Talin A.A., vonAllmen P. Mat Res Soc. 498:1998;185.
11. deHeer W.A.et al. Science. 270:1995;1179.
12. deHeer W.A.et al. Adv Mats. 9:1997;87.
13. Wang O.H., Corrigan T.D., Dai J.Y., Krauss A.R. App Phys Lett. 70:1997;3308.
14. Obraztsov AN et al. ISDED-2, Osaka, 1998.
15. Bandis C., Pate B.B. App Phys Lett. 69:1996;366.
16. Groning O., Kuttel O., Groning P., Schlapbach L. App Phys Lett. 71:1997;2253.
17. Robertson J. Mat Res Soc Symp Proc. 471:1997;217.
18. Robertson J. Mat Res Soc Symp Proc. 498:1998;197.
19. Ristein J., Schafer J., Ley L. Diamond Related Mats. 4:1995;508.
20. Schafer J., Ristein J., Ley L. J Vac Sci Technol A. 15:1997;408.
21. Cui J.B., Ristein J., Ley L. Phys Rev Lett. 81:1998;429.
22. J Rutter M., Robertson J. Phys Rev B. 57:1998;9241.
23. Modinos A. Surface Sci. 42:1974;205.
24. Xu W.S., Tzeng Y., Latham R.V. J Phys D. 26:1993;1776.
25. Huang et al Z.H. J Vac Sci Technol B. 13:1995;522.
26. Pate B, Chang WY, Bandis C, Okano K. ISDED-2, Osaka 1998.
27. Collins A.T. Physica B. 185:1993;284.
28. Davis R.F. J Vac Sci Technol A. 1:1993;829.