SCOPUS 정보 검색 플랫폼

Energy Procedia

Volumn 8, Issue , 2011, Pages 592-597

Investigation of ablation mechanisms for selective laser ablation of silicon nitride layers

(6) Heinrich, Gerrit a,b Bähr, Mario a Stolberg, Klaus c Wütherich, Tobias d Leonhardt, Marcel e Lawerenz, Alexander a

a CIS Forschungsinstititut für Mikrosensorik und Photovoltaik GmbH (Germany)

b ILMENAU UNIVERSITY OF TECHNOLOGY (Germany)

c JENOPTIK Laser Optik Systeme GmbH (Germany)

d Bosch Solar Energy AG (Germany)

e Roth und Rau AG (Germany)

Author keywords

Ablation; Laser processing; Si solar cells; Ultra short pulse laser

Indexed keywords

LASER ABLATION; SHEET RESISTANCE; SILICON; SILICON NITRIDE; SILICON SOLAR CELLS; ULTRAFAST LASERS; ULTRASHORT PULSES;

ABLATION MECHANISMS; LASER PROCESS; MICROSCOPY IMAGES; PICOSECOND LASER; SI SOLAR CELLS; THREE-WAVELENGTHS; THRESHOLD FLUENCES; ULTRA-SHORT PULSE LASER;

ABLATION;

EID: 80052098535 PISSN: 18766102 EISSN: None Source Type: Conference Proceeding
DOI: 10.1016/j.egypro.2011.06.188 Document Type: Conference Paper

Times cited : (31)

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