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Journal of Analytical Atomic Spectrometry

Volumn 26, Issue 9, 2011, Pages 1858-1862

Oxidation state sensitivity of Eu Lγ4 emission and its applications to oxidation state selective EXAFS spectroscopy of EuPd 2Si2

(6) Hayashi, Hisashi a Kanai, Noriko a Takehara, Yuki a Kawamura, Naomi b Mizumaki, Masaichiro b Mitsuda, Akihiro c

a JAPAN WOMEN'S UNIVERSITY (Japan)

b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

c KYUSHU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTRUMS; EXTENDED X-RAY ABSORPTION FINE STRUCTURES; HIGH RESOLUTION; MULTI-DETECTORS; OXIDATION STATE; PARTIAL FLUORESCENCE YIELDS; SPECTRAL SHAPES; STRUCTURAL PHASE TRANSITION; TEMPERATURE-INDUCED; VALENCE CHANGE; VALENCE TRANSITIONS;

ABSORPTION SPECTROSCOPY; EMISSION SPECTROSCOPY; EUROPIUM; EXCITED STATES; EXTENDED X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; OXIDATION; SILICON; SPECTROMETERS; SPECTROMETRY;

EUROPIUM COMPOUNDS;

EID: 80052062914 PISSN: 02679477 EISSN: 13645544 Source Type: Journal
DOI: 10.1039/c1ja10089k Document Type: Article

Times cited : (16)

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