Formation of Si nanocrystals in glass by femtosecond laser micromachining

Materials Letters

Volumn 65, Issue 23-24, 2011, Pages 3544-3547

  Lin, Geng ^a,b   Pan, Huaihai ^a,b   Dai, Ye ^c   He, Fei ^a   Chen, Danping ^a   Cheng, Ya ^a   Jiang, Xiongwei ^a   Zhang, Long ^a   Qiu, Jianrong ^d   Zhao, Quanzhong ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c SHANGHAI UNIVERSITY   (China)

^d SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Laser processing; Nanocrystalline materials; Optical materials and properties

Indexed keywords

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LASER MATERIALS PROCESSING; NANOCRYSTALLINE MATERIALS; NANOCRYSTALS; NONLINEAR OPTICS; OPTICAL SWITCHES; REFRACTIVE INDEX; SILICON; TRANSMISSION ELECTRON MICROSCOPY; ULTRASHORT PULSES; X RAY DIFFRACTION;

FEMTOSECOND LASER MICROMACHINING; KHZ FEMTOSECOND LASER; LASER PROCESS; OPTICAL MATERIALS AND PROPERTIES; REFRACTIVE INDEX PROFILES; THIRD-ORDER OPTICAL NONLINEARITIES; TRANSMISSION ELECTRON; Z-SCAN MEASUREMENT;

BOROSILICATE GLASS;

EID: 80052025466     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2011.07.106     Document Type: Article

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