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Applied Physics A: Materials Science and Processing

Volumn 93, Issue 1, 2008, Pages 183-188

Formation of Si structure in glass with a femtosecond laser

(5) Miura, Kiyotaka a Hirao, Kazuyuki a Shimotsuma, Yasuhiko a Sakakura, Masaaki a Kanehira, Shingo a

a KYOTO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CALCIUM; CHLORINE COMPOUNDS; FORMING; GLASS; IRRADIATION; LASER BEAMS; LASER FUSION; LASER PULSES; LASERS; METALLIC GLASS; MIXING; NANOCRYSTALS; NANOSTRUCTURES; PULSED LASER APPLICATIONS; SHOCK WAVES; SILICATES; THICKNESS MEASUREMENT; ULTRASHORT PULSES;

CALCIUM IONS; DEPOSITION PROCESSING; FEMTO-SECOND LASER; FEMTO-SECOND LASER PULSES; FOCUSED LASER; HEAT-TREATMENT; HIGH TEMPERATURES; LASER IRRADIATIONS; LASER PROCESSING; MICRO-SIZE PARTICLES; SI CLUSTERS; SI PARTICLES; SI-NANOCRYSTALS; SILICATE GLASSES; STARTING MATERIALS; THERMITE;

SILICON;

EID: 49649105449 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4660-6 Document Type: Article

Times cited : (33)

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