Electroforming for replicating nanometer-level smooth surface

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 4, 2011, Pages 2886-2889

  Mimura, Hidekazu ^a,b   Ishikura, Hiroyuki ^a   Matsuyama, Satoshi ^a   Sano, Yasuhisa ^a   Yamauchi, Kazuto ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Arc plasma deposition; Elastic emission machining; Electrodeposition; Electroforming; Nanometer level smooth surface

Indexed keywords

ARC PLASMA DEPOSITION; BINDING MATERIALS; BINDING STRENGTH; ELASTIC EMISSION MACHINING; ELECTRON BEAM DEPOSITIONS; ROOT MEAN SQUARE; SEPARATION METHODS; SMOOTH SURFACE;

DEPOSITION; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROFORMING; ELECTROMETALLURGY; ELECTRON BEAMS; METALLIC FILMS; SURFACE ROUGHNESS;

SURFACES;

CHROMIUM; NANOMATERIAL;

ARTICLE; CHEMISTRY; ELECTROMAGNETIC FIELD; MATERIALS TESTING; PARTICLE SIZE; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

CHROMIUM; ELECTROMAGNETIC FIELDS; MATERIALS TESTING; NANOSTRUCTURES; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 80051951154     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2011.3889     Document Type: Article

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