Resonant Raman scattering in ZnO:Mn and ZnO:Mn:Al thin films grown by RF sputtering

Journal of Physics Condensed Matter

Volumn 23, Issue 33, 2011, Pages

  Cerqueira, M F ^a   Vasilevskiy, M I ^a   Oliveira, F ^a   Rolo, A G ^a   Viseu, T ^a   Ayres De Campos, J ^a   Alves, E ^b   Correia, R ^c  

^a UNIVERSITY OF MINHO   (Portugal)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^c UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CASCADE MODEL; DOPED MATERIALS; HIGHER ORDER; LO PHONONS; LONGITUDINAL OPTICAL PHONONS; NANOCRYSTALLINE ZNO; NONRESONANT; PHONON DISPERSION CURVES; RADIO FREQUENCY MAGNETRON SPUTTERING; RAMAN PEAK; RESONANCE CONDITION; RESONANT RAMAN SCATTERING; RF-SPUTTERING; WAVE VECTOR; ZNO;

ALUMINUM; DOPING (ADDITIVES); MANGANESE; PHONONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; THIN FILMS;

ZINC OXIDE;

ALUMINUM; MANGANESE; ZINC OXIDE;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; MATERIALS TESTING; PARTICLE SIZE; RAMAN SPECTROMETRY; SURFACE PROPERTY;

ALUMINUM; CRYSTALLIZATION; MANGANESE; MATERIALS TESTING; PARTICLE SIZE; SPECTRUM ANALYSIS, RAMAN; SURFACE PROPERTIES; ZINC OXIDE;

EID: 80051921086     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/23/33/334205     Document Type: Article

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