Effects of nanowire height on pool boiling performance of water on silicon chips

International Journal of Thermal Sciences

Volumn 50, Issue 11, 2011, Pages 2084-2090

  Yao, Z ^a   Lu, Y W ^b   Kandlikar, S G ^c  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c Rochester Institute of Technology   (United States)

Author keywords

Direct growth; Nanowire; Pool boiling; Wettability

Indexed keywords

CU NANOWIRES; DIRECT GROWTH; ELECTROCHEMICAL DEPOSITION; HEAT TRANSFER APPLICATIONS; HEAT TRANSFER PERFORMANCE; POOL BOILING; SI NANOWIRE; SI SUBSTRATES; SI SURFACES; SILICON CHIP;

HEAT FLUX; HEAT TRANSFER; LAKES; PHASE TRANSITIONS; SILICON; SURFACES;

NANOWIRES;

EID: 80051910301     PISSN: 12900729     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijthermalsci.2011.06.009     Document Type: Article

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