Coverage-dependent variation of adsorption configurations of methionine on Ge(100)

Chemistry - An Asian Journal

Volumn 6, Issue 9, 2011, Pages 2362-2367

  Yang, Sena ^a   Kim, Yaewon ^a   Park, Sunmin ^a   Kim, Ki Jeong ^b   Lee, Hangil ^a  

^a Sookmyung Women's University   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

adsorption; core level photoelectron spectroscopy; density functional calculations; germanium; low energy electron diffraction

Indexed keywords

ADSORPTION STRUCTURES; BONDING CONFIGURATIONS; CORE LEVEL PHOTOEMISSION SPECTROSCOPY; CORE-LEVEL PHOTOELECTRON SPECTROSCOPY; CORE-LEVEL SPECTRA; DATIVE-BONDED STRUCTURE; DFT CALCULATION; GE(100); GE(100) SURFACE; STABLE ADSORPTION; STABLE STRUCTURES; SURFACE REORIENTATION;

AMINO ACIDS; DIFFRACTION; EMISSION SPECTROSCOPY; GERMANIUM; LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; SPECTRUM ANALYSIS; SULFUR;

ADSORPTION;

GERMANIUM; METHIONINE;

ADSORPTION; ARTICLE; CHEMISTRY; SURFACE PROPERTY; X RAY PHOTOELECTRON SPECTROSCOPY;

ADSORPTION; GERMANIUM; METHIONINE; PHOTOELECTRON SPECTROSCOPY; SURFACE PROPERTIES;

EID: 80051764839     PISSN: 18614728     EISSN: 1861471X     Source Type: Journal    
DOI: 10.1002/asia.201100004     Document Type: Article

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