Structure of thin-film nickel-carbon composites formed by microwave plasma-enhanced chemical vapor deposition

Journal of Surface Investigation

Volumn 5, Issue 4, 2011, Pages 791-795

  Uglov, V V ^a   Astashynskaya, M V ^a   Kuleshov, A K ^a   Samtsov, M P ^a   Barna, P B ^b  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONCENTRATIONS; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; PHYSICAL SPUTTERING; REACTIVE GAS;

CHEMICAL VAPOR DEPOSITION; NICKEL; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

CARBON CARBON COMPOSITES;

EID: 79961149560     PISSN: 10274510     EISSN: 18197094     Source Type: Journal    
DOI: 10.1134/S1027451011080143     Document Type: Article

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