Photoelectron emission control with polarized light in plasmonic metal random structures

Applied Physics Letters

Volumn 99, Issue 4, 2011, Pages

  Word, R C ^a   Fitzgerald, J ^a   Konenkamp R ^a  

^a PORTLAND STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION RATES; FEMTOSECOND LASER PULSE; LOCALIZED SURFACE PLASMON; MULTI-PHOTON PHOTOEMISSION; NEAR-FIELD; NON-LINEARITY; ON/OFF RATIO; PHOTO-ELECTRON EMISSION; PHYSICAL PROCESS; PLASMON EXCITATIONS; PLASMONIC; POLARIZATION DEPENDENCE; RANDOM STRUCTURES;

ELECTROMAGNETIC WAVE POLARIZATION; ELECTRONS; EMISSION CONTROL; LASER EXCITATION; MULTIPHOTON PROCESSES; PLASMONS; SURFACE PLASMON RESONANCE; ULTRAFAST LASERS; ULTRASHORT PULSES;

PHOTONS;

EID: 79961039017     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3615783     Document Type: Article

References (22)

1. M. Shapiro and P. Brumer, Principles of the Quantum Control of Molecular Processes (Wiley-Interscience, Hoboken, NJ, 2003).
2. S. A. Rice and M. Zhao, Optical Control of Molecular Dynamics (John Wiley & Sons, New York, 2000).
3. M. I. Stockman, S. V. Faleev, and D. J. Bergman, Phys. Rev. Lett. 88, 067402 (2002). 10.1103/PhysRevLett.88.067402
4. A. Kubo, K. Onda, H. Petek, Z. Sun, Y. S. Jung, and H. K. Kim, Nano Lett. 5, 1123 (2005). 10.1021/nl0506655 (Pubitemid 40925427)
5. Z.-W. Liu, Q.-H. Wei, and X. Zhang, Nano Lett. 5, 957 (2005). 10.1021/nl0506094 (Pubitemid 40749061)
6. T. Brixner and G. Gerber, Opt. Lett. 26, 557 (2001). 10.1364/OL.26.000557
7. E. J. Sanchez, L. Novotny, and X. S. Xie, Phys. Rev. Lett. 82, 4014 (1999). 10.1103/PhysRevLett.82.4014
8. T. Brixner, F. J. Garcia de Abajo, J. Schneider, and W. Pfeiffer, Phys. Rev. Lett. 95, 093901 (2005). 10.1103/PhysRevLett.95.093901 (Pubitemid 41505842)
9. S. Link and M. A. El-Sayed, Annu. Rev. Phys. Chem. 54, 331 (2003). 10.1146/annurev.physchem.54.011002.103759
10. E. Hutter and J. H. Fendler, Adv. Mater. 16, 1685 (2004). 10.1002/adma.v16:19
11. R. C. Word, T. Dornan, and R. Könenkamp, Appl. Phys. Lett. 96, 251110 (2010). 10.1063/1.3457921
12. R. Könenkamp, R. C. Word, G. F. Rempfer, T. Dixon, L. Almaraz, and T. Jones, Ultramicroscopy 110, 899 (2010). 10.1016/j.ultramic.2010.04.005
13. J. Kupersztych and M. Raynaud, Phys. Rev. Lett. 95, 147401 (2005). 10.1103/PhysRevLett.95.147401 (Pubitemid 41777611)
14. T. Tsang, T. Srinivasan-Rao, and J. Fischer, Opt. Lett. 15, 866 (1990). 10.1364/OL.15.000866
15. H. Chen, J. Boneberg, and P. Leiderer, Phys. Rev. B 47, 9956 (1993). 10.1103/PhysRevB.47.9956
16. H. X. Xu and M. Kall, ChemPhysChem 4, 1001 (2003). 10.1002/cphc.200200544
17. P. G. Etchegoin, C. Galloway, and E. C. Le Ru, Phys. Chem. Chem. Phys. 8, 2624 (2006). 10.1039/b603725a
18. H. Wei and F. Hao, Nano Lett. 8, 2497 (2008). 10.1021/nl8015297
19. B. Hecht, H. Bielefeldt, L. Novotny, Y. Inouye, and D. W. Pohl, Phys. Rev. Lett. 77, 1889 (1996). 10.1103/PhysRevLett.77.1889
20. W. J. Johnston, J. P. Prineas, and A. L. Smirl, J. Appl. Phys. 101, 046101 (2007). 10.1063/1.2433994 (Pubitemid 46362984)
21. L. Cao, R. A. Nome, J. M. Montgomery, S. K. Gray, and N. F. Scherer, Nano Lett. 10, 3389 (2010). 10.1021/nl101285t
22. X.-R. Su, Z.-S. Zhang, L.-H. Zhang, Q.-Q. Li, C.-C. Chen, Z.-J. Yang, and Q.-Q. Wang, Appl. Phys. Lett. 96, 043113 (2010). 10.1063/1.3293443