Emission properties from induced structural degradation of a-C:H thin film

Transactions on Electrical and Electronic Materials

Volumn 12, Issue 3, 2011, Pages 89-92

  Yoo, Young Zo ^a   Song, Jeong Hwan ^b  

^a Samsung Corning Co Ltd   (South Korea)

^b PaiChai University   (South Korea)

Author keywords

a C:H film; Dehydrogenation; Graphite like; Plasma enhanced chemical vapor deposition; Thermal energy

Indexed keywords

A-C:H FILMS; A-C:H THIN FILM; AS ANNEALING; EMISSION PROPERTIES; FOURIER TRANSFORM INFRARED; GRAPHITE-LIKE; HE-CD LASERS; HYDROGENATED AMORPHOUS CARBON (A-C:H); MAXIMUM VALUES; PHOTOLUMINESCENCE INTENSITIES; PL INTENSITY; RED SHIFT; ROOM TEMPERATURE; SILICON SUBSTRATES; STRUCTURAL CHANGE; STRUCTURAL DEGRADATION; THERMAL-ANNEALING;

AMORPHOUS CARBON; AMORPHOUS SILICON; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DEHYDROGENATION; DEPOSITION; FOURIER TRANSFORMS; GRAPHITE; INFRARED LASERS; IRRADIATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

AMORPHOUS FILMS;

EID: 79960711363     PISSN: 12297607     EISSN: 20927592     Source Type: Journal    
DOI: 10.4313/TEEM.2011.12.3.89     Document Type: Article

References (12)

1. J. Robertson, J. Non-Cryst. Solids 164-166, 1115 (1993) [DOI: 10.1016/0022-3093(93)91194-8].
2. J. Robertson, Adv. Phys. 35, 317 (1986) [DOI: 10.1080/00018738600101911].
3. D. Wang, P. C. Hoyle, J. R. A. Cleaver, G. A. Porkolab, and N. C. MacDonald, J. Vac. Sci. Technol. B 13, 1984 (1995) [DOI:10.1116/1.588119].
4. S. Y. Lo, R. H. Yeh, T. R. Yu, and J. W. Hong, IEEE Trans. Electron Devices 56, 57 (2009) [DOI: 10.1109/TED.2008.2008710].
5. H. C. Tsai and D. B. Bogy, J. Vac. Sci. Technol. A 5, 3287 (1987) [DOI: 10.1116/1.574188].
6. Y. Hamakawa, T. Toyama, and H. Okamoto, J. Non-Cryst. Solids 115, 180 (1989) [DOI: 10.1016/0022-3093(89)90398-0].
7. M. Koos, I. Pocsik, and L. Toth, Appl. Phys. Lett. 65, 2245 (1994) [DOI: 10.1063/1.112777].
8. S. Xu, M. Hundhausen, J. Ristein, B. Yan, and L. Ley, J. Non- Cryst. Solids 164-166, 1127 (1993) [DOI: 10.1016/0022-3093(93)91197-b].
9. Y. Z. Yoo, H. Kim, H. K. Jang, Y. Jeong, and G. Kim, J. Vac. Sci. echnol. A 16, 2210 (1998) [DOI: 10.1116/1.581329].
10. Y. S. Park and B. Hong, J. Non-Cryst. Solids 354, 3980 (2008) DOI: 10.1016/j.jnoncrysol.2008.05.043].
11. F. Gaspari, R. V. Kruzelecky, P. K. Lim, L. S. Sidhu, and S. Zukotynski,. Appl. Phys. 79, 2684 (1996) [DOI: 10.1063/1.361139].
12. H. K. Jang, G. Kim, Y. S. Lee, S. W. Whangbo, C. N. Whang, Y. Z. oo, and H. G. Kim, J. Vac. Sci. Technol. A 17, 2607 (1999) [DOI:10.1116/1.581919].